发明授权
US5714781A Semiconductor device having a gate electrode in a grove and a diffused region under the grove 失效
半导体器件具有沟槽中的栅电极和沟槽下的扩散区域

Semiconductor device having a gate electrode in a grove and a diffused
region under the grove
摘要:
A power MOSFET having a groove for forming a channel improved for shortening the switching time and increasing the dielectric breakdown strength of the gate oxide film is disclosed. The power MOSFET includes a concave structure in which a gate oxide film at a groove bottom is thickened. Namely, since the gate oxide film between a gate electrode and a first conductivity type semiconductor layer is thick, the capacitance of the oxide film therebetween is reduced. Therefore, the input and output capacitance of the gate oxide film can be reduced, and switching loss can be also reduced since the switching time can be shortened. Further, greater dielectric breakdown strength of the gate oxide film can be obtained as a result of the thickened gate oxide film at the groove bottom.
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