发明授权
- 专利标题: Polishing pad and method of use
- 专利标题(中): 抛光垫及使用方法
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申请号: US653239申请日: 1996-05-24
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公开(公告)号: US5733176A公开(公告)日: 1998-03-31
- 发明人: Karl M. Robinson , Michael A. Walker
- 申请人: Karl M. Robinson , Michael A. Walker
- 申请人地址: ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: ID Boise
- 主分类号: B24B37/22
- IPC分类号: B24B37/22 ; B24B37/24 ; B24B37/26 ; B24D3/34 ; B24D11/00 ; B24D13/14 ; B24B1/00
摘要:
A novel polishing pad having voids and optional abrasives incorporated therein is disclosed. The contents of each void facilitates the detection of the end point at which the polishing pad becomes worn out during a polishing operation. Chemicals stored within voids are released by the breaching of the voids caused by the polishing operation. The chemical released is selected to halt the chemical polishing, change the color of the pad, or to detectably change the torque load on the rotating fixed abrasive pad. Empty voids cause an noise from fluids such as air being forced into the voids. The visual or audible diagnostic resulting from the breaching of voids help to control the polishing operation and thus increase yield.
公开/授权文献
- US5064437A Knee joint endoprosthesis 公开/授权日:1991-11-12
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