发明授权
US5747772A Laser marking method including raster scanning of rapidly rewritten
liquid crystal mask
失效
激光打标方法包括快速重写液晶面罩的光栅扫描
- 专利标题： Laser marking method including raster scanning of rapidly rewritten liquid crystal mask
- 专利标题（中）： 激光打标方法包括快速重写液晶面罩的光栅扫描
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申请号： US793830申请日： 1997-02-18
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公开(公告)号： US5747772A公开(公告)日： 1998-05-05
- 发明人: Yukinori Matsumura , Hirokazu Tanaka
- 申请人： Yukinori Matsumura , Hirokazu Tanaka
- 申请人地址： JPX Kanagawa
- 专利权人： Komatsu Ltd.
- 当前专利权人： Komatsu Ltd.
- 当前专利权人地址： JPX Kanagawa
- 优先权： JPX6-195559 19940819
- 主分类号： G02F1/13
- IPC分类号： G02F1/13 ; B23K26/00 ; B23K26/06 ; G06K1/12
摘要：
The invention relates to a laser marking method in which a laser beam is used for raster scanning of a liquid-crystal mask, on which a desired marking pattern is formed and the laser beam passing through the liquid-crystal mask gives a marking to an object. A marking pattern on the liquid-crystal mask is successively switched over to a subsequent marking pattern every scanning line, to reduce variation in transmissivity of the liquid-crystal mask, thereby obtaining marking with less unevenness of image.
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