发明授权
- 专利标题： N-vinyllactam derivatives and polymer thereof
- 专利标题（中）： N-乙烯基内酰胺衍生物及其聚合物
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申请号： US713085申请日： 1996-09-12
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公开(公告)号： US5750680A公开(公告)日： 1998-05-12
- 发明人: Jin Baek Kim , Min Ho Jung , Kyeong Ho Chang
- 申请人： Jin Baek Kim , Min Ho Jung , Kyeong Ho Chang
- 申请人地址： KRX KRX
- 专利权人： Hyundai Electronics Industries Co., Ltd.,Korea Advanced Institute of Science & Technology
- 当前专利权人： Hyundai Electronics Industries Co., Ltd.,Korea Advanced Institute of Science & Technology
- 当前专利权人地址： KRX KRX
- 优先权： KRX9530063 19950914
- 主分类号： G03F7/039
- IPC分类号： G03F7/039 ; C07D205/08 ; C07D207/26 ; C07D207/273 ; C07D207/277 ; C07D211/74 ; C07D223/10 ; C07D405/12 ; C07F7/10 ; C07F9/553 ; C08F26/00 ; C08F26/06 ; C08F26/10 ; G03F7/004 ; G03F7/038 ; C08F30/08 ; G03C1/60
摘要：
N-vinyllactam derivatives protected at the 3-position are provided and represented by the following formula (I). These are polymerized into homo- and copolymers for use in microlithography of semiconductor manufacture. The polymers are used as a photoresist material suitable for a deep UV process so that pictures of high sensitivity and high resolution can be obtained. In addition, ultrafine circuits can be formed and an exceptional improvement in pattern formation can be accomplished through the use of the photoresist of the invention. ##STR1##
公开/授权文献
- US5153380A Wave separator housing structure 公开/授权日：1992-10-06
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