摘要:
N-vinyllactam derivatives protected at the 3-position are provided and represented by the following formula (I). These are polymerized into homo- and copolymers for use in microlithography of semiconductor manufacture. The polymers are used as a photoresist material suitable for a deep UV process so that pictures of high sensitivity and high resolution can be obtained. In addition, ultrafine circuits can be formed and an exceptional improvement in pattern formation can be accomplished through the use of the photoresist of the invention.
摘要:
N-vinyllactam derivatives protected at the 3-position are provided and represented by the following formula (I). These are polymerized into homo- and copolymers for use in microlithography of semiconductor manufacture. The polymers are used as a photoresist material suitable for a deep UV process so that pictures of high sensitivity and high resolution can be obtained. In addition, ultrafine circuits can be formed and an exceptional improvement in pattern formation can be accomplished through the use of the photoresist of the invention. ##STR1##
摘要:
Copolymers containing N-vinyllactam derivatives protected at 3-position are provided and represented by the following formula. The copolymers are used as a photoresist material suitable for deep uv process so that high sensitivity and resolution can be obtained. In addition, ultrafine circuits can be formed and an exceptional improvement in PED stability can be accomplished by use of the photoresist.
摘要:
Copolymers containing N-vinyllactam derivatives protected at 3-position are provided and represented by the following formula. The copolymers are used as a photoresist material suitable for deep uv process so that high sensitivity and resolution can be obtained. In addition, ultrafine circuits can be formed and an exceptional improvement in PED stability can be accomplished by use of the photoresist. ##STR1##
摘要:
A fan including a hub part, a blade part and a vibration-absorbing boss, all constituent elements of which are injection molded, thereby reducing production costs. The fan has a minimized contact area between the vibration-absorbing boss and the hub part to prevent the vibration-absorbing boss from being deformed by high-temperature heat during insert injection molding of the hub part and the blade part while assuring sufficient strength of the hub part.
摘要:
A centrifugal blower capable of preventing generation of a swirled air stream in a space between the inner surface of a casing and a side end of a centrifugal fan, and an air conditioner having the same. The centrifugal blower includes a casing having an air inlet, an air outlet, and a bell-mouth located near the air inlet, a centrifugal fan installed in the casing, and a stream-cutoff member provided at an inner surface of the casing around the bell-mouth to prevent an air stream from being swirled in a space between the inner surface of the casing and a side end of the centrifugal fan.
摘要:
There is a vinyl 4-hydroxybenzal-vinylalcohol-vinyl acetate copolymer, a 4-t-butoxycarbonyloxybenzal-vinyl alcohol-vinyl acetate copolymer and a vinyl 4-t-butoxycarbonyloxybenzal-vinyl 4-hydroxybenzal-vinyl alcohol-vinyl acetate copolymer suitable for photoresist and methods for preparing the same. The latter two polymers contain 4-hydroxybenzal groups all or parts of which are protected with t-butoxycarbonyl group. Superior in transparency, thermal stability, mechanical strength, and adhesiveness to silicon wafer, the photoresists prepared from the protected copolymers can enhance the resolution of fine circuit by virtue of low weight loss upon the thermal treatment after exposure.
摘要:
There is a vinyl 4-hydroxybenzal-vinylalcohol-vinyl acetate copolymer, a 4-t-butoxycarbonyloxybenzal-vinyl alcohol-vinyl acetate copolymer and a vinyl 4-t-butoxycarbonyloxybenzal-vinyl 4-hydroxybenzal-vinyl alcohol-vinyl acetate copolymer suitable for photoresist and methods for preparing the same. The latter two polymers contain 4-hydroxybenzal groups all or parts of which are protected with t-butoxycarbonyl group. Superior in transparency, thermal stability, mechanical strength, and adhesiveness to silicon wafer, the photoresists prepared from the protected copolymers can enhance the resolution of fine circuit by virtue of low weight loss upon the thermal treatment after exposure.
摘要:
A vinyl 4-tetrahydropyranyloxybenzal-vinyl 4-hydroxybenzal-vinyl tetrahydropyranyl ether-vinyl acetate copolymer, a vinyl 4-tetrahydropyranyloxybenzal-vinyl tetrahydropyranyl ether-vinyl acetate copolymer and a preparation method thereof are provided. The copolymers have excellent transparency because they are very low in optical absorbance in the deep uv range. In addition, the acetal structure in the backbone and in the substituted groups endows the photoresist of the copolymer with superior dry etch resistance.
摘要:
An outdoor unit for an air conditioner is disclosed. The outdoor unit according to the present invention comprises a housing which has an air inlet and an air outlet, a ventilation fan rotatably mounted in the housing, and a fan guard connected to the housing to cover the air outlet. Here, the fan guard comprises a plurality of closed ribs arranged sequentially and concentrically between a center and an outline thereof, and a plurality of radial ribs arranged in radial directions to interconnect the plurality of closed ribs, in such a manner that some of the closed ribs, which are disposed at intermediate positions near tips of the ventilation fan, are at a further distance from the ventilation fan than the other closed ribs, which are disposed near the center and the outline. Accordingly, since the fan guard is convexly raised at a position corresponding to the tips of the ventilation fan, thereby guaranteeing a predetermined space between the fan guard and the tips where the airflow is fastest, the flow resistance and the flow-induced noise can be reduced.