发明授权
- 专利标题: Avalanche photodiode for light detection
- 专利标题(中): 用于光检测的雪崩光电二极管
-
申请号: US516234申请日: 1995-08-17
-
公开(公告)号: US5763903A公开(公告)日: 1998-06-09
- 发明人: Masaaki Mandai , Tomoyuki Yoshino , Tadao Akamine , Yutaka Saitoh , Junko Yamanaka , Osamu Koseki
- 申请人: Masaaki Mandai , Tomoyuki Yoshino , Tadao Akamine , Yutaka Saitoh , Junko Yamanaka , Osamu Koseki
- 申请人地址: JPX
- 专利权人: Seiko Instruments Inc.
- 当前专利权人: Seiko Instruments Inc.
- 当前专利权人地址: JPX
- 优先权: JPX6-193414 19940817; JPX6-194417 19940818; JPX7-203061 19950809
- 主分类号: H01L27/144
- IPC分类号: H01L27/144 ; H01L31/02 ; H01L31/0203 ; H01L31/107 ; H01L31/0328
摘要:
An avalanche photodiode for detecting x-rays and other radiation comprises a first substrate having a portion removed therefrom, a first insulating film formed on the first substrate, a second substrate comprising a floating zone silicon semiconductor substrate disposed on the first insulating film, an impurity region selectively formed in the second substrate at a surface corresponding to the removed portion, a PN junction formed on the second substrate, a glass substrate mounted to the second substrate, a first electrode formed on the first substrate for applying a voltage to the impurity region, a second electrode formed on the second substrate for applying a voltage to the second substrate, a third electrode formed on the glass substrate and electrically connected to the second electrode, and an integrated circuit package having a lead pin connected to the third electrode. Accordingly, a shallow depletion layer may be provided on a floating zone SOI substrate. The substrates may be joined to the glass substrate using a eutectic bonding process.
信息查询
IPC分类: