发明授权
- 专利标题: Method of manufacturing a solid state imaging device
- 专利标题(中): 制造固态成像装置的方法
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申请号: US647785申请日: 1996-05-15
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公开(公告)号: US5766980A公开(公告)日: 1998-06-16
- 发明人: Tomoko Ohtagaki , Yoshikazu Sano
- 申请人: Tomoko Ohtagaki , Yoshikazu Sano
- 申请人地址: JPX Osaka
- 专利权人: Matsushita Electronics Corporation
- 当前专利权人: Matsushita Electronics Corporation
- 当前专利权人地址: JPX Osaka
- 优先权: JPX6-55551 19940325; JPX7-059532 19950317
- 主分类号: G03F7/00
- IPC分类号: G03F7/00 ; H01L31/0232 ; H01L31/18
摘要:
The method of manufacturing a solid state imaging device of the invention comprises a step of adding carboxylate as a dyeing assistant auxiliary to the aqueous dyestuff solution when forming dyeing layers of acrylic-based resin on a semiconductor substrate on which a solid state imaging element is formed. Therefore this invention provides a solid state imaging device with a color filter which is dyed densely, is flat, thin, and excellent in spectral characteristics. A transparent planarization resin layer (the material is e.g. acrylic) is formed on a semiconductor substrate, and a shading layer and a planarization resin layer are successively formed thereon. A synthetic resin is prepared and added photosensitizer of diazo compound. On the above-mentioned planarization resin layer, the layer of the synthetic resin is coated to be 0.2 to 0.8 .mu.m thick, for example, by a spin coat method. Then the synthetic resin is selectively exposed with a stepper, and developed to form patterns of a color filter. Then, the resin with the pattern is dyed to be a cyan layer. In the step, ammonium acetate and a urea compound are added to the aqueous dyestuff solution.
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