- 专利标题: Apparatus and methods for wafer debonding using a liquid jet
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申请号: US742938申请日: 1996-10-31
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公开(公告)号: US5783022A公开(公告)日: 1998-07-21
- 发明人: Gi-ho Cha , Byoung-hun Lee
- 申请人: Gi-ho Cha , Byoung-hun Lee
- 申请人地址: KRX
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KRX
- 优先权: KRX1995-39045 19951031
- 主分类号: H01L27/12
- IPC分类号: H01L27/12 ; B26D3/28 ; B26F3/00 ; B32B43/00 ; H01L21/00 ; H01L21/02 ; H01L21/20 ; H01L21/30 ; H01L21/304 ; H01L21/58 ; B32B35/00
摘要:
Wafer debonding of a bonded bulk wafer and a device wafer using a liquid jet to avoid scratching of the wafers is provided. The wafer debonder includes a wafer loader having a first stand with a flat upper surface and a second stand located above the first stand having a lower surface slanted with respect to the upper surface of the first stand at a predetermined angle. A first holder is connected to the first stand and a second holder is located on an imaginary surface extended from the lower surface of the second stand for holding the wafers. A liquid jetting nozzle is positioned adjacent the wafer loader to direct a jet of liquid at the interface between the wafers to separate the wafers.
公开/授权文献
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