发明授权
US5789322A Low volume gas distribution assembly for a chemical downstream etch tool
失效
用于化学下游蚀刻工具的低体积气体分配组件
- 专利标题： Low volume gas distribution assembly for a chemical downstream etch tool
- 专利标题（中）： 用于化学下游蚀刻工具的低体积气体分配组件
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申请号： US870110申请日： 1997-06-05
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公开(公告)号： US5789322A公开(公告)日： 1998-08-04
- 发明人: William Brown , Harald Herchen , Ihi Nzeadibe , Walter Merry
- 申请人： William Brown , Harald Herchen , Ihi Nzeadibe , Walter Merry
- 申请人地址： CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： CA Santa Clara
- 主分类号： H01L21/302
- IPC分类号： H01L21/302 ; H01J37/32 ; H01L21/3065 ; C23C16/00 ; H01L21/00
摘要：
An improved low-volume gas distribution assembly for a chemical downstream etch tool includes a focusing collar positioned within a process chamber and having a depending shroud in close proximity to a wafer chuck. An apertured gas delivery conduit rests on channels formed in slanted sides of a central tube of the focusing collar. The apertures in the gas delivery conduit are patterned and dimensioned to provide substantially uniform distribution of a process gas over the upper surface of the workpiece. The central tube is sealed with a cover plate and the process chamber is covered with a chamber lid.
公开/授权文献
- US5334055A Electrical connector 公开/授权日：1994-08-02
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