发明授权
US5793472A Exposure method using reference marks on both the mask and the substrate
and capable of providing high alignment precision even after multiple
exposures
失效
曝光方法使用掩模和基板上的参考标记，并且即使在多次曝光之后也能够提供高对准精度
- 专利标题： Exposure method using reference marks on both the mask and the substrate and capable of providing high alignment precision even after multiple exposures
- 专利标题（中）： 曝光方法使用掩模和基板上的参考标记，并且即使在多次曝光之后也能够提供高对准精度
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申请号： US940287申请日： 1997-09-30
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公开(公告)号： US5793472A公开(公告)日： 1998-08-11
- 发明人: Kazuhiko Hori , Kei Nara , Seiji Miyazaki
- 申请人： Kazuhiko Hori , Kei Nara , Seiji Miyazaki
- 申请人地址： JPX Tokyo
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX6-332971 19941214
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F9/00 ; H01L21/027
摘要：
Alignment between a mask and a photosensitive substrate is performed using a first reference mark formed on the mask and a second reference mark formed on the photosensitive substrate. After that, the mask and the photosensitive substrate are relatively moved, so that an image of one of a light-shielding pattern and a light-transmitting pattern formed at a position different from the first reference mark on the mask is formed on the second reference mark on the photosensitive substrate. Then, a circuit pattern formed on the mask is transferred onto the photosensitive substrate, and a partial region including the second reference mark is exposed with the image of one of the light-shielding pattern and the light-transmitting pattern.
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