公开(公告)号：US20120137736A1

公开(公告)日：2012-06-07

申请号：US13357117

申请日：2012-01-24

申请人： Osamu Sakamoto ,  Chikao Tanaka ,  Seiji Miyazaki ,  Satoru Ohkawa

发明人： Osamu Sakamoto ,  Chikao Tanaka ,  Seiji Miyazaki ,  Satoru Ohkawa

IPC分类号： C03B3/02 ,  C03B5/00 ,  C03B25/00

CPC分类号： C03B3/026 ,  C03B3/00 ,  C03B5/025 ,  C03B5/2353 ,  F27B3/10 ,  F27B3/20 ,  F27D3/10 ,  Y02P40/52 ,  Y02P40/55

摘要： The present invention provides a glass-melting furnace etc. which can maintain homogeneity of molten glass in an apparatus and a process for producing molten glass by melting glass raw material particles and glass cullet pieces.In the present invention, glass raw material particles are dropped from a glass raw material particle heating unit 14 constituted by oxygen combustion burners 34, 34 . . . and a glass raw material particle feed portion, and the glass raw material particles are changed into liquid glass particles 38, 38 . . . in high-temperature gas phases produced by flames 32, 32 . . . of oxygen combustion burners 34, 34 . . . . In the step of heating and melting the glass raw material particles, glass cullet pieces 30, 30 . . . are feed by an feed means 40 of a glass cullet piece feed portion 12 so as to be spread radially toward the plurality of flames 32, 32 . . . around the feed portion.

摘要翻译： 本发明提供一种能够保持熔融玻璃在设备中的均匀性的玻璃熔化炉等，以及通过熔化玻璃原料颗粒和玻璃碎片来制造熔融玻璃的方法。 在本发明中，玻璃原料颗粒从由氧燃烧器34,34构成的玻璃原料颗粒加热单元14中滴下。 。 。 玻璃原料粒子供给部，玻璃原料粒子变成液晶玻璃粒38,38。 。 。 在由火焰32,32产生的高温气相中。 。 。 的氧燃烧器34,34。 。 。 。 在玻璃原料颗粒加热熔融的步骤中，玻璃碎片30,30。 。 。 通过玻璃碎片进给部分12的进给装置40进给，以便朝向多个火焰32,32径向扩展。 。 。 围绕进料部分。

公开(公告)号：US20080266539A1

公开(公告)日：2008-10-30

申请号：US12213730

申请日：2008-06-24

申请人： Kei Nara ,  Seiji Miyazaki ,  Yasuo Aoki

发明人： Kei Nara ,  Seiji Miyazaki ,  Yasuo Aoki

IPC分类号： G03B27/42 ,  G03B27/58

CPC分类号： G03F7/70991 ,  G03F7/70525

摘要： A device production system includes a substrate transport section which transports a substrate; a plurality of exposure sections each of which is capable of exposing the substrate; and a controller which cooperatively controls the substrate transport section and the plurality of exposure sections so that operation states of the plurality of exposure sections are in desired states. Accordingly, it is possible to improve the efficiency both in using the substrate and in the device production.

摘要翻译： 一种装置生产系统，包括：基板输送部，其输送基板; 多个曝光部，其能够使基板曝光; 以及控制器，其协作地控制所述基板输送部和所述多个曝光部，使得所述多个曝光部的操作状态处于期望状态。 因此，可以提高使用基板和装置制造中的效率。

公开(公告)号：US06380427B1

公开(公告)日：2002-04-30

申请号：US09463664

申请日：2000-01-28

申请人： Seiji Miyazaki ,  Akira Ogawa ,  Yasutaka Nakashima ,  Yoshiaki Kobayashi ,  Mikiyoshi Araki

发明人： Seiji Miyazaki ,  Akira Ogawa ,  Yasutaka Nakashima ,  Yoshiaki Kobayashi ,  Mikiyoshi Araki

IPC分类号： C07C5142

CPC分类号： C07C51/43 ,  C07C57/04

摘要： A process for purification of (meth)acrylic acid which comprises adding to a crude (meth)acrylic acid one or two or more polar organic substances as a second component at a concentration of 1-35% by weight, crystallizing (meth)acrylic acid from the resulting (meth)acrylic acid solution, and separating the precipitated crystal of (meth)acrylic acid and a mother liquor from each other.

摘要翻译： 一种纯化（甲基）丙烯酸的方法，其包括以1-35重量％的浓度向粗制的（甲基）丙烯酸中加入一种或两种以上作为第二成分的极性有机物质，结晶（甲基）丙烯酸 从（甲基）丙烯酸溶液中分离析出的（甲基）丙烯酸和母液的析出晶体。

公开(公告)号：US06189032B1

公开(公告)日：2001-02-13

申请号：US09015220

申请日：1998-01-29

申请人： Seiichi Susaki ,  Hisashi Umeki ,  Katsuyuki Umezawa ,  Seiji Miyazaki ,  Kazuo Matsunaga ,  Makoto Kitagawa

发明人： Seiichi Susaki ,  Hisashi Umeki ,  Katsuyuki Umezawa ,  Seiji Miyazaki ,  Kazuo Matsunaga ,  Makoto Kitagawa

IPC分类号： G06F15173

CPC分类号： G06F21/40 ,  G06F21/31

摘要： A client-server system is provided in which access to a service by a user can properly be controlled, even if an approval by another user is required for receiving the service. First, the server 2 executes a log-in processing by using a user identifier and password transmitted from the client terminal 2, and a user control file 202. Next, the server 2 executes a service control by using a service supply request transmitted from the client terminal 1 and a service control file 42 provided with the server. When the server determines that an approval by another user is required for providing the service, the server executes the approval request to the client terminal 1 that the concerned user uses. When the reply to the approval request is affirmative, the server executes the processing in accordance with the foregoing service supply request. When the reply is negative, the server informs to the user who made the foregoing service supply request that the approval is rejected.

摘要翻译： 提供了一种客户机 - 服务器系统，其中即使需要其他用户的批准来接收服务，用户可以正确地控制对服务的访问。 首先，服务器2通过使用从客户终端2发送的用户标识符和密码以及用户控制文件202来执行登录处理。接下来，服务器2通过使用从服务器2发送的服务提供请求来执行服务控制 客户终端1和提供有服务器的服务控制文件42。 当服务器确定需要其他用户的批准来提供服务时，服务器向相关用户使用的客户终端1执行批准请求。 当对批准请求的答复是肯定的时，服务器根据上述服务提供请求执行处理。 当答复为否定的时候，服务器向用户通知上述服务提供请求是否拒绝批准。

公开(公告)号：US5849441A

公开(公告)日：1998-12-15

申请号：US790862

申请日：1997-02-03

申请人： Kei Nara ,  Seiji Miyazaki ,  Hideki Koitabashi

发明人： Kei Nara ,  Seiji Miyazaki ,  Hideki Koitabashi

IPC分类号： G03F9/00

CPC分类号： G03F9/7011 ,  G03F9/00 ,  G03F9/7003 ,  G03F9/7076 ,  G03F9/7088 ,  Y10S438/975

摘要： In order to provide a search alignment method capable of high-speed alignment without a relative movement between an alignment system and a substrate, an alignment mark is constituted by a plurality of element marks having shapes different from each other, the plurality of element marks are provided in such a manner that each two of them has a gap a little shorter than the size of the field of view of the alignment system therebetween, and if even one of the element marks constituting the alignment mark comes into the field of view of the alignment system, said element mark is identified out of all of said element marks, whereby the position of the entire alignment is measured from the position of said one element mark. Therefore, if the alignment mark is moved in a range wider than the field of view of the alignment system, it is possible to detect the position of the alignment mark by one measurement.

摘要翻译： 为了提供能够在对准系统和基板之间没有相对移动的情况下进行高速对准的搜索对准方法，由具有彼此不同的形状的多个元素标记构成对准标记，多个元素标记 设置成使得它们中的每一个具有比它们之间的对准系统的视场尺寸稍短的间隙，并且如果构成对准标记的元件标记中的一个进入到 对准系统中，从所有元件标记中识别所述元件标记，由此从所述一个元件标记的位置测量整个对准的位置。 因此，如果对准标记在比对准系统的视野宽的范围内移动，则可以通过一次测量来检测对准标记的位置。

公开(公告)号：US5798822A

公开(公告)日：1998-08-25

申请号：US950964

申请日：1997-10-15

申请人： Seiji Miyazaki ,  Hiroshi Shirasu ,  Kazuaki Saiki ,  Tsuyoshi Narabe

发明人： Seiji Miyazaki ,  Hiroshi Shirasu ,  Kazuaki Saiki ,  Tsuyoshi Narabe

IPC分类号： G03F7/207 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G01B11/00

CPC分类号： G03F7/70691 ,  G03F7/70358 ,  G03F9/7026

摘要： A pair of reference plates is so arranged as to have a predetermined positional relationship on a carriage that integrally holds a mask and a photosensitive substrate such that the mask and the photosensitive substrate oppose each other on two sides of a projecting optical system. By periodically detecting the positional relationship between the reference plates in the optical axis direction, a variation with time occurring in the detection characteristics of position detecting devices is detected. Both stable image formation characteristics and a high throughput are realized by correcting a driving signal to be supplied to a driving device in accordance with the detected variation.

摘要翻译： 一对参考板被布置为在一体地保持掩模和感光基板的托架上具有预定的位置关系，使得掩模和感光基板在投影光学系统的两侧彼此相对。 通过周期性地检测基准板在光轴方向上的位置关系，检测位置检测装置的检测特性中随时间的变化。 通过根据检测到的变化来校正要提供给驱动装置的驱动信号，实现稳定的图像形成特性和高吞吐量。

公开(公告)号：US5657130A

公开(公告)日：1997-08-12

申请号：US408714

申请日：1995-03-22

申请人： Hiroshi Shirasu ,  Kazuaki Saiki ,  Seiji Miyazaki ,  Susumu Mori

发明人： Hiroshi Shirasu ,  Kazuaki Saiki ,  Seiji Miyazaki ,  Susumu Mori

IPC分类号： G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  G01B11/00

CPC分类号： G03F7/70216 ,  G03F7/70275 ,  G03F7/70358 ,  G03F7/70791 ,  G03F9/70

摘要： In an exposure apparatus and method, a mask and a substrate are scanned in synchronism with each other so that the pattern of the mask may be transferred onto the substrate through a projection optical system. First beams of light are irradiated to least two locations on the mask spaced apart in a direction intersecting the scanning direction of the mask. The reflected light thereof is received, and the positions of the points on the mask to which the beam of light has been irradiated are detected in the direction of the optical axis of the projection optical system. In addition, second beams of light are irradiated to at least two locations on the substrate spaced apart in the scanning direction, and the reflected light thereof is received. The positions of the points on the substrate to which the second beam of light has been irradiated are also detected in the direction of the optical axis of the projection optical system are detected. The posture of at least one of the mask and the substrate is adjusted on the basis of the positions detected with the first and second beams.

摘要翻译： 在曝光装置和方法中，掩模和基板彼此同步地扫描，使得掩模的图案可以通过投影光学系统被转印到基板上。 第一光束照射在与掩模的扫描方向相交的方向间隔开的掩模上的至少两个位置。 在投影光学系统的光轴的方向上检测其反射光，并且在光束照射的掩模上的点的位置被检测。 此外，第二光束照射到沿扫描方向间隔开的基板上的至少两个位置，并且其反射光被接收。 检测到在投影光学系统的光轴的方向上检测到已经照射第二光束的基板上的点的位置。 基于由第一和第二光束检测到的位置来调整掩模和基板中的至少一个的姿势。

公开(公告)号：US5617211A

公开(公告)日：1997-04-01

申请号：US515783

申请日：1995-08-16

申请人： Kei Nara ,  Toshio Matsuura ,  Muneyasu Yokota ,  Yukio Kakizaki ,  Yoshio Fukami ,  Seiji Miyazaki ,  Tsuyoshi Narabe

发明人： Kei Nara ,  Toshio Matsuura ,  Muneyasu Yokota ,  Yukio Kakizaki ,  Yoshio Fukami ,  Seiji Miyazaki ,  Tsuyoshi Narabe

IPC分类号： G03F7/20 ,  G03F9/00 ,  G01B11/00 ,  G01U21/86 ,  G06K7/015 ,  G03B27/52

CPC分类号： G03F7/70241 ,  G03F7/70275 ,  G03F7/70358 ,  G03F9/70

摘要： This invention relates to an exposure apparatus for synchronously scanning a mask and a photosensitive substrate with respect to a plurality of projection optical systems, thereby properly transferring an entire pattern area on the mask onto the photosensitive substrate. A plurality of sets of mask-side reference marks and substrate-side reference marks are arranged at positions corresponding to each other on the mask surface and the photosensitive substrate surface and at least at two positions conjugate with the plurality of projection optical systems. The displacement amount between an image of a mask-side reference mark or a substrate-side reference mark formed on the corresponding substrate-side reference mark or mask-side reference mark through the projection optical system and the position of the substrate-side reference mark and the mask-side reference mark is measured. The imaging characteristics of the plurality of projection optical systems are corrected in accordance with the displacement amount.

摘要翻译： 本发明涉及一种用于相对于多个投影光学系统同时扫描掩模和感光基板的曝光装置，从而将掩模上的整个图案区域适当地转印到感光基板上。 多个掩模侧参考标记和基板侧参考标记组被布置在掩模表面和感光基板表面上并且至少在与多个投影光学系统共轭的两个位置处彼此对应的位置处。 掩模侧基准标记的图像或通过投影光学系统形成在相应的基板侧参考标记或掩模侧参考标记上的基板侧参考标记之间的位移量和基板侧参考标记的位置 并且测量掩模侧参考标记。 根据位移量校正多个投影光学系统的成像特性。

公开(公告)号：US08707738B2

公开(公告)日：2014-04-29

申请号：US13396768

申请日：2012-02-15

申请人： Osamu Sakamoto ,  Chikao Tanaka ,  Seiji Miyazaki ,  Satoru Ohkawa

发明人： Osamu Sakamoto ,  Chikao Tanaka ,  Seiji Miyazaki ,  Satoru Ohkawa

IPC分类号： C03B3/02 ,  C05B5/00

CPC分类号： C03B5/04 ,  C03B3/00 ,  C03B3/02 ,  C03B3/026 ,  C03B5/1675 ,  C03B5/2353 ,  C03B5/262 ,  Y02P40/55

摘要： A glass-melting furnace, which suppresses the effect of exhaust gas on molten glass quality, a process for producing molten glass, and a process and apparatus for producing glass products. The glass-melting furnace containing: a raw glass material particle feed portion disposed downwardly at a furnace wall portion in an upper portion of the glass-melting furnace; a heating unit provided under the feed portion, which forms a gas phase portion for converting raw glass material particles into liquid glass particles; a flue inlet disposed on the upstream side of the gas phase portion in a flow direction of the molten glass liquid; a furnace-bottom portion, which accumulates the liquid glass particles that produce the molten glass liquid; and a discharge portion, which discharges the molten glass liquid.

摘要翻译： 一种玻璃熔化炉，其抑制废气对熔融玻璃质量的影响，制造熔融玻璃的方法，以及玻璃制品的制造方法和装置。 该玻璃熔融炉包括：在玻璃熔炉的上部的炉壁部向下方配置的原料玻璃材料粒子供给部， 设置在进料部下方的加热单元，其形成用于将原料玻璃材料粒子转化为液态玻璃粒子的气相部分; 烟道入口，其设置在所述熔融玻璃液体的流动方向上的气相部分的上游侧; 堆积产生熔融玻璃液体的液体玻璃颗粒的炉底部分; 以及排出熔融玻璃液体的排出部。

公开(公告)号：US20120216571A1

公开(公告)日：2012-08-30

申请号：US13463193

申请日：2012-05-03

申请人： Osamu Sakamoto ,  Chikao Tanaka ,  Seiji Miyazaki ,  Satoru Ohkawa

发明人： Osamu Sakamoto ,  Chikao Tanaka ,  Seiji Miyazaki ,  Satoru Ohkawa

IPC分类号： C03B5/235 ,  C03B25/00

CPC分类号： C03B5/2353 ,  C03B3/026 ,  C03B5/027 ,  C03B5/207 ,  C03B2211/25 ,  C03B2211/40 ,  C03B2211/60 ,  C03C3/078 ,  C03C3/089 ,  C03C3/091

摘要： Glass raw material particles are dropped from an oxygen combustion burner 24, and the glass raw material particles are heated by a flame F of an oxygen combustion burner 24 and a thermal plasma P, to melt the particles. Liquid glass particles 30 produced by the melting fall downwardly in a melting tank 12, and fall on a surface of a molten glass liquid G in the melting tank 12. Then, an upper layer G1 of the molten glass liquid G is heated by electrodes 40, 40 of a heating apparatus 38 provided in the melting tank 12. By this method, air and residual gas generated in the molten glass liquid G and the liquid glass particles 30 fallen onto the surface of the molten glass liquid G, become bubbles, surface and are smoothly discharged.

摘要翻译： 玻璃原料颗粒从氧燃烧器24中滴下，玻璃原料颗粒被氧燃烧器24的火焰F和热等离子体P加热，以熔化颗粒。 通过熔化产生的液体玻璃颗粒30在熔池12中向下落下，落在熔池12中的熔融玻璃液G的表面上。然后，熔融玻璃液G的上层G1被电极40加热 ，设置在熔池12中的加热装置38中。通过这种方法，在熔融玻璃液G和液态玻璃颗粒30中产生的空气和残余气体落在熔融玻璃液体G的表面上，成为气泡，表面 并顺利放电。