发明授权
- 专利标题: Apparatus for forming crystalline film
- 专利标题(中): 用于形成晶体膜的装置
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申请号: US671806申请日: 1996-06-25
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公开(公告)号: US5795396A公开(公告)日: 1998-08-18
- 发明人: Shunichi Ishihara , Jun-ichi Hanna
- 申请人: Shunichi Ishihara , Jun-ichi Hanna
- 申请人地址: JPX Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX1-081106 19890331
- 主分类号: C30B25/00
- IPC分类号: C30B25/00 ; C23C16/24 ; C23C16/44 ; C23C16/455 ; C23C16/46 ; C30B25/02 ; C30B25/10 ; C23C16/00
摘要:
An apparatus for forming a deposited film which includes a film forming chamber, with a means to evacuate the inside of the chamber. A substrate holder for holding a substrate is located in the chamber. Starting material gas is supplied to the chamber to enable film formation. A light energy source is also provided to irradiate the substrate in order to heat its surface. The strength of the light energy is controlled to provide a non-uniform temperature distribution pattern on the substrate.
公开/授权文献
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