发明授权
- 专利标题: Process for treating photographic processing waste solution
- 专利标题(中): 处理照相处理废液的方法
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申请号: US399658申请日: 1995-03-07
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公开(公告)号: US5795485A公开(公告)日: 1998-08-18
- 发明人: Takashi Nakamura , Haruhiko Iwano , Koji Matsuo
- 申请人: Takashi Nakamura , Haruhiko Iwano , Koji Matsuo
- 申请人地址: JPX Kanagawa
- 专利权人: Fuji Photo Film Co.,Ltd.
- 当前专利权人: Fuji Photo Film Co.,Ltd.
- 当前专利权人地址: JPX Kanagawa
- 优先权: JPX6-065744 19940309
- 主分类号: G03C5/00
- IPC分类号: G03C5/00 ; C02F1/52 ; C02F1/56 ; C02F1/62 ; G03D3/00
摘要:
A process for treating a photographic processing waste solution which comprises: placing a polymer precipitate in a lower portion of a tank having a U-shaped treating space which comprises (i) a first partition, (ii) a second partition and (iii) an interconnecting partition for interconnecting the first partition and the second partition in the lower portion of a tank; introducing into the first partition a photographic processing waste solution containing a processing solution having fixing ability which has processed a silver halide photographic material; treating the photographic processing waste solution in the U-shaped treating space in the presence of a polymer having S atom which can coordinate with a metal; and removing the metal in said photographic processing waste solution.
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