Invention Grant
- Patent Title: Chemical vapor deposition method
- Patent Title (中): 化学气相沉积法
-
Application No.: US741921Application Date: 1996-10-31
-
Publication No.: US5800753APublication Date: 1998-09-01
- Inventor: Robert F. Donadio
- Applicant: Robert F. Donadio
- Applicant Address: NH Hudson
- Assignee: Performance Materials, Inc.
- Current Assignee: Performance Materials, Inc.
- Current Assignee Address: NH Hudson
- Main IPC: C30B23/08
- IPC: C30B23/08 ; C04B35/583 ; C23C14/24 ; C23C16/01 ; C23C16/34 ; C30B23/06 ; F27B14/10 ; F27D1/16 ; H01L21/203 ; C23C16/00
Abstract:
A method and mandrel apparatus for making a unibody containment structure, such as an molecular beam epitaxy cell crucible, with a negative draft portion, via chemical vapor deposition.
Public/Granted literature
- US5412018A Silicone rubber reinforced with reinforced precipitated silica Public/Granted day:1995-05-02
Information query
IPC分类:
