- 专利标题： Etching process which protects metal
-
申请号： US566513申请日： 1995-12-04
-
公开(公告)号： US5801103A公开(公告)日： 1998-09-01
- 发明人: Robert T. Rasmussen , Surjit S. Chadha , David A. Cathey
- 申请人： Robert T. Rasmussen , Surjit S. Chadha , David A. Cathey
- 申请人地址： ID Boise
- 专利权人： Micron Technology, Inc.
- 当前专利权人： Micron Technology, Inc.
- 当前专利权人地址： ID Boise
- 主分类号： H01L21/311
- IPC分类号： H01L21/311 ; H01L21/3213 ; H01L21/302
摘要：
The present invention is directed to a novel etching process for a semiconductor material which inhibits corrosion of metal comprised of pretreating the material, preferably with a surfactant, and then exposing the material to a mixture comprising a buffered oxide etch.
公开/授权文献
- USD327645S Bottle 公开/授权日：1992-07-07
信息查询
IPC分类:
