发明授权
- 专利标题： Photosensitive composition and lithographic printing plate
- 专利标题（中）： 光敏组合物和平版印刷版
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申请号： US778783申请日： 1997-01-06
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公开(公告)号： US5814431A公开(公告)日： 1998-09-29
- 发明人: Hideki Nagasaka , Akihisa Murata , Toshiyuki Urano , Ryuichiro Takasaki
- 申请人： Hideki Nagasaka , Akihisa Murata , Toshiyuki Urano , Ryuichiro Takasaki
- 申请人地址： JPX Tokyo
- 专利权人： Mitsubishi Chemical Corporation
- 当前专利权人： Mitsubishi Chemical Corporation
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX8-002176 19960110; JPX8-054849 19960312; JPX8-193587 19960723
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/038 ; G03C1/725
摘要：
A photosensitive composition comprising (a) a resin selected from the group consisting of novolak resins and polyvinylphenol resins; (b) an amino compound derivative capable of curing the resin; (c) at least one member selected from the group consisting of cyanine compounds of the following formula (I) and polymethine compounds of the following formula (II), as a compound showing absorption in a near infrared wavelength region: ##STR1## (d) a photosensitive acid-forming agent.
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