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    Photopolymerizable composition and photosensitive lithographic printing plate
    2.
    发明授权
    Photopolymerizable composition and photosensitive lithographic printing plate 失效
    光聚合组合物和光敏平版印刷版

    公开(公告)号：US5738974A

    公开(公告)日：1998-04-14

    申请号：US520724

    申请日：1995-08-29

    申请人： Hideki Nagasaka ,  Toshiyuki Urano ,  Akihisa Murata

    发明人： Hideki Nagasaka ,  Toshiyuki Urano ,  Akihisa Murata

    IPC分类号： G03F7/029

    CPC分类号： G03F7/029 ,  Y10S430/12 ,  Y10S430/121 ,  Y10S430/127 ,  Y10S430/148

    摘要： A photopolymerizable composition comprising an addition polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator system, wherein the photopolymerization initiator system comprises: (a) a titanocene compound, and (b) at least one coumarin compound of the following formula (I): ##STR1## wherein (i) each of R.sup.1, R.sup.2 and R.sup.5 is a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group, each of R.sup.3 and R.sup.4 is an alkyl group, provided that at least one of R.sup.3 and R.sup.4 is a C.sub.4-16 alkyl group, or (ii) R.sup.1 is a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group, and at least one set of R.sup.2 and R.sup.3, and R.sup.4 and R.sup.5, is connected to form an alkylene group substituted by a lower alkyl group, provided that when they do not form the connecting group, each of R.sup.2 and R.sup.5 is a hydrogen atom, a halogen atom, an alkyl group or an alkoxy group, and each of R.sup.3 and R.sup.4 is an alkyl group; R.sup.6 is a hydrogen atom, an alkyl group, an alkoxy group, an acyl group, a cyano group, or a carboxyl group or a group of its ester derivative or amide derivative, and R.sup.7 is a heterocyclic residue having a total number of carbon atoms of from 3 to 17.

    摘要翻译： 一种可光聚合组合物，其包含具有至少一个烯属不饱和双键的加成聚合化合物和光聚合引发剂体系，其中所述光聚合引发剂体系包括：（a）二茂钛化合物和（b）至少一种下式的香豆素化合物 I）：其中（i）R1，R2和R5各自为氢原子，卤素原子，烷基或烷氧基，R3和R4各自为烷基，条件是在 R3和R4中的至少一个是C4-16烷基，或（ii）R1是氢原子，卤素原子，烷基或烷氧基，以及至少一个R2和R3以及R4和R5， 连接形成被低级烷基取代的亚烷基，条件是当它们不形成连接基团时，R 2和R 5各自为氢原子，卤素原子，烷基或烷氧基，R 3 R4为烷基; R6为氢原子，烷基，烷氧基，酰基，氰基或羧基或其酯衍生物或酰胺衍生物的基团，R7为碳原子数为 从3到17。

    Polymerizable composition containing pyrromethene type coloring matter and titanocene compound
    6.
    发明授权
    Polymerizable composition containing pyrromethene type coloring matter and titanocene compound 失效
    含有亚甲基吡咯型色素和二茂钛化合物的可聚合组合物

    公开(公告)号：US5498641A

    公开(公告)日：1996-03-12

    申请号：US224879

    申请日：1994-04-08

    申请人： Toshiyuki Urano ,  Hideki Nagasaka ,  Masaaki Tsuchiyama ,  Hiroshi Ide

    发明人： Toshiyuki Urano ,  Hideki Nagasaka ,  Masaaki Tsuchiyama ,  Hiroshi Ide

    IPC分类号： C08F2/50 ,  G03F7/029 ,  C08F4/14 ,  C08F4/649

    CPC分类号： G03F7/029 ,  C09B23/04 ,  C09B69/105

    摘要： A photopolymerizable composition comprising at least an addition polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator system, which system comprises (a) a sensitizer of the formula (I): ##STR1## wherein each of R.sup.1 to R.sup.6 is hydrogen, halogen, alkyl, aryl, aralkyl, acyl, alkoxycarbonyl, optionally substituted hydrocarbon ring, optionally substituted heterocyclic residue or --SO.sub.3 --R.sup.8, wherein R.sup.8 is hydrogen, alkyl, aryl, aralkyl, alkali metal, or quaternary ammonium, R.sup.7 is hydrogen, alkyl, aryl, aralkyl, optionally substituted hydrocarbon ring, or optionally substituted heterocyclic group, each of X.sup.1 and X.sup.2 is halogen, alkyl, aryl, aralkyl, optionally substituted hydrocarbon ring, or optionally substituted heterocyclic group, and (b) a titanocene compound.

    摘要翻译： 至少包含具有至少一个烯键式不饱和双键的加聚聚合化合物和光聚合引发剂体系的可光聚合组合物，该体系包含（a）式（I）的敏化剂：基，卤素，烷基，芳基，芳烷基，酰基 ，烷氧基羰基，任选取代的烃环，任选取代的杂环残基或-SO 3 -R 8，其中R 8是氢，烷基，芳基，芳烷基，碱金属或季铵，R 7是氢，烷​​基，芳基，芳烷基，任选取代的烃环 或任选取代的杂环基，X 1和X 2各自为卤素，烷基，芳基，芳烷基，任选取代的烃环或任选取代的杂环基，和（b）二茂钛化合物。

    Photopolymerizable composition
    7.
    发明授权
    Photopolymerizable composition 失效
    可光聚合组合物

    公开(公告)号：US5607817A

    公开(公告)日：1997-03-04

    申请号：US292755

    申请日：1994-08-18

    申请人： Hideki Nagasaka ,  Masaaki Tsuchiyama ,  Toshiyuki Urano

    发明人： Hideki Nagasaka ,  Masaaki Tsuchiyama ,  Toshiyuki Urano

    IPC分类号： B41C1/05 ,  C08F2/50 ,  G03C1/675 ,  G03F7/027 ,  G03F7/028 ,  G03F7/029 ,  G03F7/031 ,  H01L21/027 ,  G03C1/73

    CPC分类号： C08F2/50 ,  G03F7/031 ,  Y10S430/117 ,  Y10S430/121 ,  Y10S430/127

    摘要： A photopolymerizable composition comprising an addition polymerizable compound having at least one ethylenically unsaturated double bond and a photopolymerization initiator system, wherein the photopolymerization initiator system comprises:(a) a sensitizer of the formula (I) ##STR1## wherein -A is ##STR2## wherein each of R.sup.1 and R.sup.2 is a hydrogen atom, an alkyl group, an aryl group or a halogen atom, each of R.sup.3 and R.sup.4 is an alkyl group which may have substituents, each of R.sup.5 to R.sup.8 is a hydrogen atom, an alkyl group or an alkoxy group, or R.sup.3 and R.sup.4, R.sup.3 and R.sup.5 and/or R.sup.4 and R.sup.6 bond to each other to form a ring structure, and n is 0, 1 or 2; and each of X.sup.1 and X.sup.2 is -A as defined above, an alkyl group, an aralkyl group, an aryl group, a heterocyclic group, an alkoxy group, an aryloxy group, a carboalkoxy group, an amino group or a vinyl group; and(b) at least one active agent capable of generating active radicals when irradiated in the co-existence of the sensitizer.

    摘要翻译： 一种可光聚合组合物，其包含具有至少一个烯键式不饱和双键的加成聚合化合物和光聚合引发剂体系，其中所述光聚合引发剂体系包括：（a）式（I）的敏化剂，其中-A是 其中R 1和R 2各自为氢原子，烷基，芳基或卤素原子，R 3和R 4各自为可具有取代基的烷基，R 5至R 8各自为氢原子， 烷基或烷氧基，或R3和R4，R3和R5和/或R4和R6彼此键合形成环结构，n为0,1或2; X1，X2分别为-A，烷基，芳烷基，芳基，杂环基，烷氧基，芳氧基，碳烷氧基，氨基或乙烯基。 和（b）当在敏化剂的共存中照射时能够产生活性自由基的至少一种活性剂。