摘要:
New routes involving multi-step reversible photo-chemical reactions using two-step techniques to provide non-linear resist for lithography are described in this disclosure. They may provide exposure quadratically dependant on the intensity of the light. Several specific examples, including but not limited to using nanocrystals, are also described. Combined with double patterning, these approaches may create sub-diffraction limit feature density.
摘要:
The present invention is directed to phosphorus containing (or “halogen free”) flame retardant photoimagable compositions useful as a coverlay material in a flexible electronic circuitry package. These compositions are generally photosensitive and comprise phosphorus containing acrylates and phosphorus-containing photo-initiators mixed with a polymer binder. The compositions of the present invention typically comprise elemental phosphorus in an amount between, and including, any two of the following numbers 2.0, 2.2, 2.4, 2.6, 2.8, 3.0, 3.2, 3.4, 3.6, 3.8, 4.0, 4.2, 4.4, 4.6, 4.8, 5.0, 5.2, 5.4, 5.6, 5.8 and 6.0 weight percent.
摘要:
An electrophotographic photoreceptor comprising a conductive support and a photosensitive layer provided on or above the conductive support, the photosensitive layer having an outermost layer comprising a cured product of a composition comprising a curable resin, a surfactant containing a fluorine atom, and a charge transporting organic compound having a specific structure.
摘要:
A relief printing original plate including a substrate, a photosensitive resin layer thereon that is photosensitive to ultraviolet radiations, and a mask layer thereon having both ultraviolet and non-ultraviolet absorbability, the ultraviolet absorbability being deactivatable in response to receiving non-ultraviolet radiation. A method for producing a relief printing plate by using the original plate is also provided.
摘要:
In a first aspect, silicon polymers are provided that have controlled ratio of silanol (Si—OH) moieties:Si atoms and/or a controlled amount of alkaline aqueous-solubilizing groups. Si-polymers of the invention are particularly useful as a photoresist resin component. In a further aspect, halogenated sulfonamide and thiol compounds and Si-containing polymers comprising such reacted monomers are provided.
摘要:
An infrared-sensitive planographic printing plate precursor including: a support; a recording layer capable of forming an image through infrared irradiation provided on or above one surface of the support, the recording layer containing a resin, which is water-insoluble and alkali-soluble, and an infrared absorbent; and an organic polymer layer provided on or above the other surface of the support, wherein when the organic polymer layer is formed, a solvent is used, and the total amount of solvent remaining in the organic polymer layer is 10 mg per gram of the organic polymer or less is provided.
摘要:
A radiographic image conversion panel includes: a support; and at least one photostimulable phosphor layer provided on the support, wherein at least one layer of the photostimulable phosphor layers is formed by a photostimulable phosphor, and an amount of an activation metal atom at an end of a photostimulable phosphor crystal and an amount of an activation metal atom in the vicinity of the support satisfy a specific formula.
摘要:
A photocurable composition containing a photopolymerizable compound, a photoinitiator, a compound selected from the group consisting of a deodorizer, a perfume and an antioxidant.
摘要:
A composition for a light-scattering film contains fluorine-containing resin fine particles each including a copolymer of a first ethylenically unsaturated monomer containing fluorine with other ethylenically unsaturated monomer component, and having an average particle diameter of 0.8 to 5.0 μm; and a transparent resin having a refractive index of 1.50 to 1.70. Where the other ethylenically unsaturated monomer component is formed of a second ethylenically unsaturated monomer containing no fluorine nor hydrophilic group, the copolymer contains 10 to 60% by weight of the first monomer, and 90 to 40% by weight of the second monomer. Where the other ethylenically unsaturated monomer component is formed of the second monomer and a third ethylenically unsaturated monomer containing a hydrophilic group, the copolymer contains 10 to 90% by weight of the first monomer, 89 to 5% by weight of the second monomer and 1 to 10% by weight of the third monomer.
摘要:
A photosensitive resin composition is comprised of (A) a polyimide resin having a weight-average molecular weight of from 5,000 to 150,000, represented by the general formula (I): ##STR1## wherein X is a specified tetravalent organic group having two benzene rings, Y is a member comprised of 30-100 mol % of a specific organic group having two benzene rings and 70-0 mol % of another specific divalent aromatic organic group, Z is a divalent organic group represented by the general formula (VI): ##STR2## wherein b is an integer of 5 to 80; and m and n each represent a number satisfying that m/(m+n) is 0.98 to 0.70 and n/(m+n) is 0.02 to 0.30; (B) an agent selected from a sensitizer and a photopolymerization initiator; and (C) an organic solvent. From this composition, polyimide films having a superior adhesion to substrates and also having no corrosive properties can be formed by low-temperature heat treatment.