发明授权
- 专利标题： Topographical selective patterns
- 专利标题（中）： 地形选择模式
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申请号： US754468申请日： 1996-11-22
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公开(公告)号： US5830376A公开(公告)日： 1998-11-03
- 发明人: Susan Nord Bohlke , Gregory M. Jellum , Douglas S. Dunn , Andrew J. Ouderkirk
- 申请人： Susan Nord Bohlke , Gregory M. Jellum , Douglas S. Dunn , Andrew J. Ouderkirk
- 申请人地址： MN St. Paul
- 专利权人： Minnesota Mining and Manufacturing Company
- 当前专利权人： Minnesota Mining and Manufacturing Company
- 当前专利权人地址： MN St. Paul
- 主分类号： C23C14/54
- IPC分类号： C23C14/54 ; B29C35/08 ; B29C59/14 ; B29C59/16 ; B41M5/24 ; C23F4/02 ; H01L21/265 ; H01L21/3205 ; H01L23/52 ; H05H1/46 ; H05K3/02 ; H05K3/10 ; B05D3/00
摘要：
A maskless process generates a patterned coating on a polymeric substrate, wherein the pattern is at least partially defined by the substrate topography. The process uses a high intensity/high fluence energy source to strike a coated substrate, thus selectively removing a portion of the coating. The amount and area of the coating removed is dependent on the substrate topography and the applied energy, and this forms a pattern of residual coating material on the substrate.
公开/授权文献
- US4111923A Octapeptides and methods for their production 公开/授权日：1978-09-05
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