发明授权
- 专利标题： Electroless deposition equipment or apparatus and method of performing electroless deposition
- 专利标题（中）： 无电沉积设备或进行无电沉积的设备和方法
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申请号： US751631申请日： 1996-11-18
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公开(公告)号： US5830805A公开(公告)日： 1998-11-03
- 发明人: Yosi Shacham-Diamand , Valery M. Dubin , Chiu H. Ting , Bin Zhao , Prahalad K. Vasudev
- 申请人： Yosi Shacham-Diamand , Valery M. Dubin , Chiu H. Ting , Bin Zhao , Prahalad K. Vasudev
- 申请人地址： NY Ithaca TX Austin CA Santa Clara
- 专利权人： Cornell Research Foundation,Sematech, Inc.,Intel Corporation
- 当前专利权人： Cornell Research Foundation,Sematech, Inc.,Intel Corporation
- 当前专利权人地址： NY Ithaca TX Austin CA Santa Clara
- 主分类号： C23C18/16
- IPC分类号： C23C18/16 ; H01L21/288 ; H01L21/44
摘要：
An electroless deposition apparatus and a method of electroless deposition that uses a single process chamber for performing multiple processes by moving through the process chamber a variety of fluids one at a time in a sequential order.
公开/授权文献
- US5324879A Oligomerization process 公开/授权日：1994-06-28
信息查询
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