Invention Grant
- Patent Title: MOSFET having a particular SOI structure
- Patent Title (中): MOSFET具有特定的SOI结构
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Application No.: US731468Application Date: 1996-10-15
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Publication No.: US5831308APublication Date: 1998-11-03
- Inventor: Dong Hoon Lee
- Applicant: Dong Hoon Lee
- Applicant Address: KRX Chungcheongbuk-Do
- Assignee: LG Semicon Co., Ltd.
- Current Assignee: LG Semicon Co., Ltd.
- Current Assignee Address: KRX Chungcheongbuk-Do
- Priority: KRX20640/1996 19960610
- Main IPC: H01L27/088
- IPC: H01L27/088 ; H01L21/336 ; H01L21/762 ; H01L21/8234 ; H01L21/8238 ; H01L21/8242 ; H01L27/092 ; H01L29/06 ; H01L29/78 ; H01L27/01 ; H01L27/12 ; H01L31/0392
Abstract:
An MOSFET includes a substrate, an active region on the substrate, a first insulating element and a second insulating element located a distance apart from each other on the active region, the first and second insulating elements dividing the active region into a source region, a drain region, and a channel region, the channel region being disposed between the source region and the drain region, a third insulating film over the active region between the first and second insulating films, and a gate electrode over the third insulating film.
Public/Granted literature
- US5138324A Device to measure the elevation angle for a radar equipped with a double curvature reflective type antenna Public/Granted day:1992-08-11
Information query
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