发明授权
- 专利标题: Microwave and far infrared drying under reduced pressure
- 专利标题(中): 微波和远红外干燥减压
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申请号: US795383申请日: 1997-02-04
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公开(公告)号: US5859412A公开(公告)日: 1999-01-12
- 发明人: Shunichi Yagi
- 申请人: Shunichi Yagi
- 专利权人: Yagi; Shunichi
- 当前专利权人: Yagi; Shunichi
- 优先权: JPX8-097310 19960328; JPX8-321194 19961118
- 主分类号: A23B4/03
- IPC分类号: A23B4/03 ; A23B7/02 ; A23L3/40 ; A23L3/54 ; A24B3/04 ; D06F58/02 ; D06F58/26 ; D06F58/28 ; F26B3/30 ; F26B3/347 ; F26B5/04 ; F26B7/00 ; F26B9/06 ; F26B23/08 ; H05B6/68 ; H05B6/80
摘要:
A method of drying objects includes the steps of placing the object into a pressure reduction tank, placing a metallic element having an acute-angled portion into the pressure reduction tank, reducing to the pressure toward a predetermined single reduced pressure value or plurality of reduced pressure values, subjecting the object to controlled microwave heating and controlled far infrared heating either separately or simultaneously, continuously heating the body of the pressure reduction tank to vaporize any water that comes into contact with the inside wall surfaces of the pressure reduction tank, detecting an electrical discharge at the acute-angled portion of the metallic element due to microwave energy, stopping or pausing the microwave heating when an electrical discharge is detected at the acute-angled portion of the metallic element, continuously measuring the change in reduced pressure at prescribed time intervals after the microwave heating has been stopped or paused upon detecting an electrical discharge due to microwave energy, and terminating the drying process when the measured change in reduced pressure reaches a predetermined target reduced pressure change value determined in accordance with the level of dryness selected and the type of object being dried.
公开/授权文献
- US5288527A Silicon nitride thin films with improved properties 公开/授权日:1994-02-22
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