Invention Grant
US5865984A Electrochemical etching apparatus and method for spirally etching a
workpiece
失效
用于螺旋蚀刻工件的电化学蚀刻装置和方法
- Patent Title: Electrochemical etching apparatus and method for spirally etching a workpiece
- Patent Title (中): 用于螺旋蚀刻工件的电化学蚀刻装置和方法
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Application No.: US885608Application Date: 1997-06-30
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Publication No.: US5865984APublication Date: 1999-02-02
- Inventor: William E. Corbin, Jr. , Madhav Datta , Thomas E. Dinan , Frederick W. Kern
- Applicant: William E. Corbin, Jr. , Madhav Datta , Thomas E. Dinan , Frederick W. Kern
- Applicant Address: NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: NY Armonk
- Main IPC: C25F3/02
- IPC: C25F3/02 ; C25F7/00
Abstract:
Disclosed is an electrochemical etching apparatus including a fixture for holding a workpiece; a nozzle, positioned opposite the fixture and facing the workpiece, for impinging an etchant onto the workpiece; and an electrode for applying a voltage between the electrode and the workpiece; wherein, in operation, one of the fixture and nozzle are rotated and the nozzle is moved radially outwardly so that the workpiece is spirally etched. Also disclosed is a method of spirally etching a workpiece.
Public/Granted literature
- US5387799A Electron beam writing system Public/Granted day:1995-02-07
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