公开(公告)号：US5865984A

公开(公告)日：1999-02-02

申请号：US885608

申请日：1997-06-30

Applicant: William E. Corbin, Jr. ,  Madhav Datta ,  Thomas E. Dinan ,  Frederick W. Kern

Inventor： William E. Corbin, Jr. ,  Madhav Datta ,  Thomas E. Dinan ,  Frederick W. Kern

IPC: C25F3/02 ,  C25F7/00

CPC classification number: C25F7/00

Abstract: Disclosed is an electrochemical etching apparatus including a fixture for holding a workpiece; a nozzle, positioned opposite the fixture and facing the workpiece, for impinging an etchant onto the workpiece; and an electrode for applying a voltage between the electrode and the workpiece; wherein, in operation, one of the fixture and nozzle are rotated and the nozzle is moved radially outwardly so that the workpiece is spirally etched. Also disclosed is a method of spirally etching a workpiece.

Abstract translation: 公开了一种电化学蚀刻装置，其包括用于保持工件的固定装置; 与所述固定装置相对并面对所述工件的喷嘴，用于将蚀刻剂撞击到所述工件上; 以及用于在电极和工件之间施加电压的电极; 其中，在操作中，夹具和喷嘴中的一个旋转，并且喷嘴径向向外移动，使得工件被螺旋蚀刻。 还公开了螺旋蚀刻工件的方法。

公开(公告)号：US06708298B2

公开(公告)日：2004-03-16

申请号：US09768122

申请日：2001-01-23

Applicant: William E. Corbin, Jr. ,  David P. Monty ,  Erik A. Nelson ,  Alan D. Norris ,  Steven W. Tomashot ,  David E. Chapman ,  Timothy E. Fiscus

Inventor： William E. Corbin, Jr. ,  David P. Monty ,  Erik A. Nelson ,  Alan D. Norris ,  Steven W. Tomashot ,  David E. Chapman ,  Timothy E. Fiscus

IPC: G11C2900

CPC classification number: G11C29/50012 ,  G11C7/1066 ,  G11C7/1072 ,  G11C7/1078 ,  G11C7/1087 ,  G11C29/50

Abstract: A method for testing the data strobe window (DQS) and data valid window (tDV) of a memory device (e.g., a DDR-type memory device) using the window strobe of a testing system.

Abstract translation: 一种使用测试系统的窗口选通来测试存储器件（例如，DDR型存储器件）的数据选通窗口（DQS）和数据有效窗口（tDV）的方法。

公开(公告)号：US06270646B1

公开(公告)日：2001-08-07

申请号：US09473909

申请日：1999-12-28

Applicant: Erick Gregory Walton ,  Dean S. Chung ,  Lara Sandra Collins ,  William E. Corbin, Jr. ,  Hariklia Deligianni ,  Daniel Charles Edelstein ,  James E. Fluegel ,  Josef Warren Korejwa ,  Peter S. Locke ,  Cyprian Emeka Uzoh

Inventor： Erick Gregory Walton ,  Dean S. Chung ,  Lara Sandra Collins ,  William E. Corbin, Jr. ,  Hariklia Deligianni ,  Daniel Charles Edelstein ,  James E. Fluegel ,  Josef Warren Korejwa ,  Peter S. Locke ,  Cyprian Emeka Uzoh

IPC: C25D522

CPC classification number: C25D17/14 ,  C25D5/06

Abstract: A metal plating apparatus is described which includes a compressible member having a conductive surface covering substantially all of the surface of the substrate to be plated. The plating current is thereby transmitted over a wide area of the substrate, rather than a few localized contact points. The compressible member is porous so as to absorb the plating solution and transmit the plating solution to the substrate. The wafer and compressible member may rotate with respect to each other. The compressible member may be at cathode potential or may be a passive circuit element.

Abstract translation: 描述了一种金属电镀装置，其包括具有覆盖待镀基板的基本上所有表面的导电表面的可压缩构件。 因此，电镀电流在衬底的广泛区域上传输，而不是几个局部接触点。 可压缩构件是多孔的，以便吸收电镀液并将电镀液传输到基底。 晶片和可压缩构件可以相对于彼此旋转。 可压缩构件可以处于阴极电位，或者可以是无源电路元件。

公开(公告)号：US20100051501A1

公开(公告)日：2010-03-04

申请号：US12201553

申请日：2008-08-29

Applicant: William E. Corbin, JR. ,  Alison K. Easton ,  James E. Fluegel ,  Christopher W. Long ,  James H. Peterman ,  Laura Mauer

Inventor： William E. Corbin, JR. ,  Alison K. Easton ,  James E. Fluegel ,  Christopher W. Long ,  James H. Peterman ,  Laura Mauer

IPC: B65D85/00

CPC classification number: H01L21/67393

Abstract: A wafer carrying structure is provided that allows more efficient operation of the opening and closing mechanisms. More specifically, the wafer carrier includes pressure relief structures that provide appropriate pressure equalization during the opening and closing operations of the wafer carrier. This allows doors on the wafer to be more easily opened and closed while also providing significant environmental isolation for the wafers during transport operations. Relief structures specifically designed to remain closed except for those brief periods of time where pressure relief is necessary to equalize pressure during opening and closing of the carrier.

Abstract translation: 提供了允许更有效地操作打开和关闭机构的晶片承载结构。 更具体地，晶片载体包括在晶片载体的打开和关闭操作期间提供适当的压力平衡的压力释放结构。 这允许晶片上的门更容易地打开和关闭，同时还在运输操作期间为晶片提供显着的环境隔离。 特别设计为保持关闭的救济结构，除了需要压力释放以在打开和关闭载体的过程中平衡压力的短暂时间内。

公开(公告)号：US06471845B1

公开(公告)日：2002-10-29

申请号：US09461849

申请日：1999-12-15

Applicant: John O. Dukovic ,  William E. Corbin, Jr. ,  Erick G. Walton ,  Peter S. Locke ,  Panayotis C. Andricacos ,  James E. Fluegel ,  Evan Patton ,  Jonathan Reid

Inventor： John O. Dukovic ,  William E. Corbin, Jr. ,  Erick G. Walton ,  Peter S. Locke ,  Panayotis C. Andricacos ,  James E. Fluegel ,  Evan Patton ,  Jonathan Reid

IPC: C25D2112

CPC classification number: C25D21/12 ,  Y10T137/2509

Abstract: A method for controlling the composition of a chemical bath in which predictive dosing is used to account for changes in the composition of the bath in which the operating characteristics of the process are partitioned into a plurality of operating modes and the consumption or generation of materials related to the process are determined empirically and additions of material are made as appropriate.

Abstract translation: 用于控制化学浴的组成的方法，其中使用预测剂量来解释浴的组成的变化，其中过程的操作特性被划分为多种操作模式以及相关材料的消耗或产生 根据经验确定该过程，并酌情添加材料。