发明授权
- 专利标题: Method of fabricating of light emitting device with controlled lattice mismatch
- 专利标题(中): 具有受控晶格失配的发光器件的制造方法
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申请号: US829214申请日: 1997-03-31
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公开(公告)号: US5872023A公开(公告)日: 1999-02-16
- 发明人: Masashi Shiraishi , Satoshi Ito , Kazushi Nakano , Akira Ishibashi , Masao Ikeda , Hiroyuki Okuyama , Katsuhiro Akimoto , Tomonori Hino , Masakazu Ukita
- 申请人: Masashi Shiraishi , Satoshi Ito , Kazushi Nakano , Akira Ishibashi , Masao Ikeda , Hiroyuki Okuyama , Katsuhiro Akimoto , Tomonori Hino , Masakazu Ukita
- 申请人地址: JPX Tokyo
- 专利权人: Sony Corporation
- 当前专利权人: Sony Corporation
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX5-222566 19930907; JPX6-015523 19940209; JPX6-095097 19940509
- 主分类号: H01L33/00
- IPC分类号: H01L33/00 ; H01L33/28 ; H01S5/32 ; H01S5/327 ; H01S3/19
摘要:
The semiconductor light emitting device includes a semiconductor substrate (1), a first conductivity type first cladding layer (2) deposited on the semiconductor substrate (1), an active layer (4) deposited on the first cladding layer (2), and the second conductivity type second cladding layer (6) deposited on the active layer (4). The first and the second cladding layers (2, 6) are made of the II/VI-compound semiconductors including at least one kind of II group elements such as Zn, Hg, Cd, Mg and at least one kind of VI group elements such as S, Se, Te. The lattice mismatching .DELTA.a/a (%) between at least one of the first cladding layer (2) and the second cladding layer (6) and the substrate is set within the range of -0.9%.ltoreq..DELTA.a/a.ltoreq.0.5% (reference symbols a and a.sub.c represent the lattice constant of the semiconductor substrate and the lattice constant of at least either of the first and second cladding layers, and .DELTA.a is obtained from .DELTA.a=a.sub.c -a).
公开/授权文献
- US5343067A High breakdown voltage semiconductor device 公开/授权日:1994-08-30
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