发明授权
US5876503A Multiple vaporizer reagent supply system for chemical vapor deposition
utilizing dissimilar precursor compositions
失效
使用不同的前体组合物进行化学气相沉积的多个蒸发剂试剂供应系统
- 专利标题: Multiple vaporizer reagent supply system for chemical vapor deposition utilizing dissimilar precursor compositions
- 专利标题(中): 使用不同的前体组合物进行化学气相沉积的多个蒸发剂试剂供应系统
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申请号: US758599申请日: 1996-11-27
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公开(公告)号: US5876503A公开(公告)日: 1999-03-02
- 发明人: Jeffrey Roeder , Peter C. Van Buskirk
- 申请人: Jeffrey Roeder , Peter C. Van Buskirk
- 申请人地址: CT Danbury
- 专利权人: Advanced Technology Materials, Inc.
- 当前专利权人: Advanced Technology Materials, Inc.
- 当前专利权人地址: CT Danbury
- 主分类号: C01G23/00
- IPC分类号: C01G23/00 ; C01G25/00 ; C01G33/00 ; C23C16/00 ; C23C16/40 ; C23C16/448 ; C23C16/455
摘要:
A system for the deposition of a multicomponent material layer on a substrate from respective liquid precursors for components of the multicomponent material layer, comprising: a vapor deposition zone; and multiple vaporizer units, each of which is joined (i) to at least one source of liquid precursor for supplying at least one liquid precursor thereto, and (ii) in vapor flow communication with the vapor deposition zone arranged to retain the substrate therein, for deposition on the substrate of vapor phase species from precursor vapor formed by vaporization of liquid precursors in the vaporizer units of the system.
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