发明授权
US5886761A Process for producing actively addressing substrate, and liquid crystal
display
失效
用于生产主动寻址衬底和液晶显示器的工艺
- 专利标题: Process for producing actively addressing substrate, and liquid crystal display
- 专利标题(中): 用于生产主动寻址衬底和液晶显示器的工艺
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申请号: US539691申请日: 1995-10-05
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公开(公告)号: US5886761A公开(公告)日: 1999-03-23
- 发明人: Tohru Sasaki , Makoto Tsumura , Masaru Takabatake , Masaaki Kitajima
- 申请人: Tohru Sasaki , Makoto Tsumura , Masaru Takabatake , Masaaki Kitajima
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX4-013364 19920128
- 主分类号: G02F1/1343
- IPC分类号: G02F1/1343 ; G02F1/136 ; G02F1/1362 ; G02F1/1368 ; G09F9/30 ; H01L21/027 ; H01L21/77 ; H01L21/84 ; H01L27/12 ; H01L29/78 ; H01L29/786 ; G02F1/1333
摘要:
A photoresist 10 is exposed to light from behind a substrate by using as photomask a wiring electrodes 2 and 4 and a switching element 8 which are individually composed of an opaque member, whereby a passivation layer 9 for the switching element 8 is patterned. By virtue of this method, a photomask becomes unnecessary and jogs of the passivation layer 9 can be formed outside the transparent pixel electrode 7. Therefore, an unsatisfactory orientation of a liquid crystal can be made invisible without enlarging the black matrix of a counter substrate. Furthermore, since a passivation layer can be removed in portions not requiring the passivation layer, image-sticking can be reduced and the quality of displayed picture can be greatly improved. The present invention makes it possible to reduce the number of photomasks used for production of an actively addressing substrate and improve the picture quality of a liquid crystal display.
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