发明授权
- 专利标题: Cyano group-containing oxime sulfonate compounds
- 专利标题(中): 含氰基的肟磺酸盐化合物
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申请号: US791814申请日: 1997-01-30
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公开(公告)号: US5892095A公开(公告)日: 1999-04-06
- 发明人: Hideo Hada , Hiroshi Komano , Toshimasa Nakayama
- 申请人: Hideo Hada , Hiroshi Komano , Toshimasa Nakayama
- 申请人地址: JPX Kawasaki
- 专利权人: Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人: Tokyo Ohka Kogyo Co., Ltd.
- 当前专利权人地址: JPX Kawasaki
- 优先权: JPX8-018008 19960202
- 主分类号: C07C307/02
- IPC分类号: C07C307/02 ; C07C309/65 ; C07C309/66 ; C07C309/73 ; G03F7/004 ; G03F7/038 ; G03F7/039 ; H01L21/027 ; C07C255/00 ; G03F5/16 ; G03F7/022
摘要:
Disclosed is a novel positive-working or negative-working chemical-sensitization photoresist composition useful in the photolithographic patterning works for the manufacture of electronic devices. The photoresist composition is characterized by a unique acid-generating agent capable of releasing an acid by the pattern-wise exposure of the resist layer to actinic rays so as to increase or decrease the solubility of the resist layer in an aqueous alkaline developer solution. The acid-generating agent proposed is a novel cyano group-containing oxime sulfonate di- or triester compound represented by the general formulaA�C(CN).dbd.N--O--SO.sub.2 --R!.sub.n,in which each R is, independently from the others, an unsubstituted or substituted monovalent hydrocarbon group such as alkyl groups, A is a divalent or tervalent organic group or, preferably, phenylene group and the subscript n is 2, when A is a divalent group, or 3, when A is a tervalent group or, preferably 2. Since more than one of sulfonic acid molecules are released from one molecule of the sulfonate compound by the exposure to actinic rays, the chemical-sensitization photoresist composition exhibits high photosensitivity.