发明授权
- 专利标题： Registration accuracy measurement mark
- 专利标题（中）： 注册精度测量标记
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申请号： US670313申请日： 1996-06-27
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公开(公告)号： US5892291A公开(公告)日： 1999-04-06
- 发明人: Koichiro Narimatsu , Shigenori Yamashita , Nobuyuki Yoshioka , Shinya Soeda , Atsushi Hachisuka , Koji Taniguchi , Yuki Miyamoto , Takayuki Saito , Ayumi Minamide
- 申请人： Koichiro Narimatsu , Shigenori Yamashita , Nobuyuki Yoshioka , Shinya Soeda , Atsushi Hachisuka , Koji Taniguchi , Yuki Miyamoto , Takayuki Saito , Ayumi Minamide
- 申请人地址： JPX Tokyo
- 专利权人： Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人： Mitsubishi Denki Kabushiki Kaisha
- 当前专利权人地址： JPX Tokyo
- 优先权： JPX7-160741 19950627; JPX8-114746 19960509
- 主分类号： G03F1/36
- IPC分类号： G03F1/36 ; G03F1/42 ; G03F7/20 ; G03F9/00 ; H01L21/027 ; H05K1/02 ; H01L23/544
摘要：
The present invention includes a first semiconductor element forming member formed in a first layer, a first measurement mark formed by the same manufacturing step as the first semiconductor element forming member, a second semiconductor element forming member formed in a second layer above the first layer, and a second measurement mark formed in the same manufacturing step as the second semiconductor element forming member for measuring registration accuracy between the first and second semiconductor element forming members. The first measurement mark has a pattern which receives same influence of aberration as the first semiconductor element forming member when irradiated with light, and the second measurement mark has a pattern which receives same influence of aberration as the second semiconductor element forming member when irradiated with light. Thus, a registration accuracy measurement mark taking into consideration the influence of aberration can be provided.
公开/授权文献
- US5111096A Isolated segmental switch reluctance motor 公开/授权日：1992-05-05