发明授权
- 专利标题： Method of forming a passivation film
- 专利标题（中）： 形成钝化膜的方法
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申请号： US213079申请日： 1994-03-15
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公开(公告)号： US5906688A公开(公告)日： 1999-05-25
- 发明人: Tadahiro Ohmi
- 申请人： Tadahiro Ohmi
- 专利权人： Ohmi; Tadahiro
- 当前专利权人： Ohmi; Tadahiro
- 主分类号： C23C8/14
- IPC分类号： C23C8/14 ; C23C14/35 ; C23C14/56 ; C23C16/44 ; F16K31/02 ; F16K51/02 ; H01J37/32 ; C22C38/44 ; C23C8/18
摘要：
A reduced pressure device the reduced pressure chamber of which is constructed of stainless steel, and includes a passivation film formed on the exposed interior surface thereof. The film has a thickness of more than 50 .ANG. and is composed of two or more layers. One layer contains mainly chrome oxide formed in the vicinity of the interface of the stainless steel and the passivation film. The other layer contains mainly iron oxide formed in the vicinity of the surface of the passivation film. A passivation film may also be used with a thickness of more than 50 .ANG. and containing mainly a mixture of chrome oxide and iron oxide. Lastly a passivation film may also be used with thickness of more than 50 .ANG. and containing mainly chrome oxide.
公开/授权文献
- US4886582A Resid hydroprocessing catalyst and method of preparation 公开/授权日：1989-12-12
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