发明授权
- 专利标题： Purged lower liner
- 专利标题（中）： 清洗下层衬垫
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申请号： US934920申请日： 1997-09-22
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公开(公告)号： US5914050A公开(公告)日： 1999-06-22
- 发明人: Paul B. Comita , David K. Carlson , Kimberly E. Klinck , Harold J. Mellen, III
- 申请人： Paul B. Comita , David K. Carlson , Kimberly E. Klinck , Harold J. Mellen, III
- 申请人地址： CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： CA Santa Clara
- 主分类号： C23C16/44
- IPC分类号： C23C16/44 ; C23C16/48 ; H01L21/205 ; C23C16/00
摘要：
Chemical vapor deposition apparatus 10 which includes a chemical vapor deposition processing chamber 12 having a base ring 18 and upper and lower quartz windows 20 and 22, and a quartz liner 26 lining the base ring 18, wherein a purge channel 46 is formed, in an outer surface of the liner 26, to remove contaminant material from an interface between the base ring 18 and the liner 26.
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