发明授权
- 专利标题： Alignment device and lithographic apparatus provided with such a device
- 专利标题（中）： 具有这种装置的对准装置和光刻设备
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申请号： US818143申请日： 1997-03-13
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公开(公告)号： US5917604A公开(公告)日： 1999-06-29
- 发明人: Peter Dirksen , Jan E. Van Der Werf , Manfred G. Tenner
- 申请人： Peter Dirksen , Jan E. Van Der Werf , Manfred G. Tenner
- 申请人地址： NY New York
- 专利权人： U.S. Philips Corporation
- 当前专利权人： U.S. Philips Corporation
- 当前专利权人地址： NY New York
- 优先权： EPX96200725 19960315
- 主分类号： H01L21/68
- IPC分类号： H01L21/68 ; G02B27/18 ; G03F9/00 ; H01L21/027 ; H01L23/544 ; G01B11/00
摘要：
A device is described for aligning a first object provided with a first alignment mark (P) with respect to a second object provided with a second alignment mark (M), which marks have a periodical structure and are imaged onto each other. By selecting beam portions from the radiation from the first alignment mark (P) with the aid of an order diaphragm (55'), which beam portions are deflected through larger angles, the sensitivity of the device to errors can be decreased. Such a device may be used to great advantage in a lithographic apparatus.
公开/授权文献
- US5158255A Wrist rest apparatus 公开/授权日：1992-10-27