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公开(公告)号：US5917604A
公开(公告)日：1999-06-29
申请号：US818143
申请日：1997-03-13
IPC分类号： H01L21/68 , G02B27/18 , G03F9/00 , H01L21/027 , H01L23/544 , G01B11/00
CPC分类号： G03F9/70 , H01L23/544 , H01L2223/5442 , H01L2223/54453 , H01L2924/0002
摘要： A device is described for aligning a first object provided with a first alignment mark (P) with respect to a second object provided with a second alignment mark (M), which marks have a periodical structure and are imaged onto each other. By selecting beam portions from the radiation from the first alignment mark (P) with the aid of an order diaphragm (55'), which beam portions are deflected through larger angles, the sensitivity of the device to errors can be decreased. Such a device may be used to great advantage in a lithographic apparatus.
摘要翻译： 描述了一种装置，用于使提供有第一对准标记（P）的第一物体相对于具有第二对准标记（M）的第二物体对准，该标记具有周期性结构并彼此成像。 通过借助于定子光阑（55'）从第一对准标记（P）的辐射中选择光束部分，这些光束部分通过较大的角度被偏转，可以减小器件对误差的灵敏度。 这样的器件可以在光刻设备中被用于很大的优点。
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2.发明授权Method of repetitively imaging a mask pattern on a substrate, and apparatus for performing the method 失效对基板上的掩模图案进行重复成像的方法以及执行该方法的装置
公开(公告)号：US5673101A
公开(公告)日：1997-09-30
申请号：US450197
申请日：1995-05-25
CPC分类号： G03F7/70675
摘要： A method and apparatus for repetitively imaging a mask pattern (C) on a substrate (W) are described. Various parameters of the apparatus and the projection lens system (PL) can be measured accurately and reliably and measuring devices of the apparatus can be calibrated by measuring a latent image of a mark by means of a scanning microscope (LID) forming a diffraction-limited radiation spot (Sp) on the photoresist layer on the substrate (W), in which layer the latent image is formed by means of a projection beam (PB).
摘要翻译： 对用于对基板（W）上的掩模图案（C）进行重复成像的方法和装置进行说明。 可以精确可靠地测量装置和投影透镜系统（PL）的各种参数，并且可以通过用形成衍射限制的扫描显微镜（LID）测量标记的潜像来校准装置的测量装置 在基板（W）上的光致抗蚀剂层上的辐射光斑（Sp），其中通过投影光束（PB）形成潜像。
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3.发明授权Radiation-source unit for generating a beam having two directions of polarisation and two frequencies 失效用于产生具有两个偏振方向和两个频率的光束的辐射源单元
公开(公告)号：US5485272A
公开(公告)日：1996-01-16
申请号：US247933
申请日：1994-05-24
CPC分类号： G03F9/7049 , G02F1/33
摘要： A radiation-source unit is described which produces a radiation beam (30) with two components (9, 10) which are polarized perpendicularly relative to one another and which have different frequencies. The unit comprises a radiation source, a beam splitter (4), an acousto-optical modulation system (13, 18) for generating the frequency difference, and a beam combiner (25). Since the beam splitter and the beam combiner are transmission elements and their connecting line extends through the center of the modulation system the unit is compact and no alignment problems occur. Moreover, the frequency difference is adjustable over a wide range.
摘要翻译： 描述了辐射源单元，其产生具有彼此垂直偏振且具有不同频率的两个分量（9,10）的辐射束（30）。 该单元包括辐射源，分束器（4），用于产生频率差的声光调制系统（13,18）和光束组合器（25）。 由于分束器和光束组合器是传输元件，并且其连接线延伸穿过调制系统的中心，所以该单元是紧凑的，并且不会发生对准问题。 此外，频率差可在宽范围内调节。
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公开(公告)号：US5910847A
公开(公告)日：1999-06-08
申请号：US800446
申请日：1997-02-18
CPC分类号： G03F7/70558 , G03F7/70675
摘要： A method and apparatus for forming a pattern on a substrate (w), either or not via a mask pattern (c), are described. The radiation dose can be measured accurately and reliably by measuring a latent image of a new, asymmetrical test mark (TM) by means of an optical alignment device present in the apparatus or associated therewith, this latent image being formed by means of production radiation (PB) in the radiation-sensitive layer on the substrate.
摘要翻译： 描述了通过掩模图案（c）或者通过掩模图案（c）在衬底（w）上形成图案的方法和装置。 通过借助存在于设备中或与其相关联的光学对准装置测量新的不对称测试标记（TM）的潜像，可以准确可靠地测量辐射剂量，该潜像通过生产辐射（ PB）在衬底上的辐射敏感层中。
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