发明授权
- 专利标题： Resist for alkali development
- 专利标题（中）： 抵抗碱发展
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申请号： US697009申请日： 1996-08-16
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公开(公告)号： US5932391A公开(公告)日： 1999-08-03
- 发明人: Toru Ushirogouchi , Koji Asakawa , Naoko Kihara , Makoto Nakase , Naomi Shida , Takeshi Okino
- 申请人： Toru Ushirogouchi , Koji Asakawa , Naoko Kihara , Makoto Nakase , Naomi Shida , Takeshi Okino
- 申请人地址： JPX Kawasaki
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JPX Kawasaki
- 优先权： JPX7-210312 19950818
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/039 ; G03F7/021
摘要：
A resist for alkali development, which comprises an alicyclic compound attached with an acidic substituent group exhibiting pKa of 7 to 11 in an aqueous solution of 25.degree. C. This alicyclic compound is preferably a copolymer comprising as a comonomer component a vinyl compound and exhibiting a light absorbency of 3 or less per 1 .mu.m to the light of 193 nm in wavelength.
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