- 专利标题： Carrier head with a substrate detection mechanism for a chemical mechanical polishing system
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申请号： US862350申请日： 1997-05-23
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公开(公告)号： US5957751A公开(公告)日： 1999-09-28
- 发明人: Boris Govzman , Steven M. Zuniga , Hung Chen , Sasson Somekh
- 申请人： Boris Govzman , Steven M. Zuniga , Hung Chen , Sasson Somekh
- 申请人地址： CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： CA Santa Clara
- 主分类号： B24B37/005
- IPC分类号： B24B37/005 ; B24B37/30 ; H01L21/304 ; B24B49/00
摘要：
A carrier head for a chemical mechanical polishing system includes a substrate sensing mechanism. The carrier head includes a base and a flexible member connected to the base to define a chamber. A lower surface of the flexible member provides a substrate receiving surface. The substrate sensing mechanism includes a sensor to measure a pressure in the chamber and generate an output signal representative thereof, and a processor configured to indicate whether the substrate is attached to the substrate receiving surface in response to the output signal.
公开/授权文献
- US5199581A Golf equipment support rack 公开/授权日：1993-04-06
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