Multiple zone carrier head with flexible membrane
    8.
    发明授权
    Multiple zone carrier head with flexible membrane 有权
    带有柔性膜的多区域载体头

    公开(公告)号:US07842158B2

    公开(公告)日:2010-11-30

    申请号:US11837412

    申请日:2007-08-10

    IPC分类号: B24B29/00

    CPC分类号: B24B37/30

    摘要: A carrier head for chemical mechanical polishing of a substrate includes a base and a flexible membrane extending beneath the base. The flexible membrane includes a central portion with an outer surface providing a substrate receiving surface, a perimeter portion connecting the central portion to the base, and at least one flap extending from an inner surface of the central portion. The flap divides a volume between the flexible membrane and the base into a plurality of chambers, and the flap includes a laterally extending first section and an angled second section extending beneath the first section and connecting the laterally extending first section to the central portion.

    摘要翻译: 用于基板的化学机械抛光的承载头包括基部和在基部下方延伸的柔性膜。 柔性膜包括具有提供基板接收表面的外表面的中心部分,将中心部分连接到基部的周边部分和从中心部分的内表面延伸的至少一个折片。 翼片将柔性膜和基部之间的体积分成多个室,并且该翼片包括横向延伸的第一部分和在第一部分下方延伸并且将横向延伸的第一部分连接到中心部分的成角度的第二部分。

    Pad conditioner
    9.
    发明授权
    Pad conditioner 有权
    垫调节剂

    公开(公告)号:US07815495B2

    公开(公告)日:2010-10-19

    申请号:US11734063

    申请日:2007-04-11

    IPC分类号: B24B53/12

    摘要: A pad conditioner is provided for conditioning a polishing pad in chemical mechanical planarization (CMP). The pad conditioner comprises a plastic abrasive portion having a first hardness and optionally a brush portion having a second hardness less than the first hardness. The plastic abrasive portion comprises a base plate and a plurality of plastic nodules formed on a surface of the base plate, each of the plastic nodules having a planar top surface, wherein the planar top surface is positioned to substantially contact a polishing pad. The brush portion may be positioned adjacent to the plastic abrasive portion, the brush portion having a plurality of brush elements positioned to substantially contact the pad.

    摘要翻译: 提供了用于在化学机械平面化(CMP)中调理抛光垫的衬垫调节器。 衬垫调节剂包括具有第一硬度的塑料磨料部分和任选地具有小于第一硬度的第二硬度的刷部分。 塑料研磨部分包括基板和形成在基板的表面上的多个塑料结节,每个塑料结节具有平坦的顶表面,其中平面顶表面被定位成基本接触抛光垫。 刷部分可以定位成与塑料研磨部分相邻,刷部分具有多个刷子元件,其定位成基本上接触焊盘。

    Carrier Ring for Carrier Head
    10.
    发明申请
    Carrier Ring for Carrier Head 有权
    载波头载波环

    公开(公告)号:US20100151777A1

    公开(公告)日:2010-06-17

    申请号:US12698912

    申请日:2010-02-02

    IPC分类号: B24D15/00

    CPC分类号: B24B37/32

    摘要: A carrier head that has a base assembly, a retaining ring assembly, a carrier ring, and a flexible membrane is described. A carrier ring has an annular upper portion and an annular lower portion having a lower surface with a smaller inner diameter than the upper surface of the annular upper portion, wherein the carrier ring circumferentially surrounds a retaining ring and has a lower surface to contact a polishing pad.

    摘要翻译: 描述了具有基座组件,保持环组件,载体环和柔性膜的承载头。 承载环具有环形上部和环形下部,其具有比环形上部的上表面更小的内径的下表面,其中承载环周向地包围保持环并且具有接触抛光的下表面 垫。