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    Method for detecting the presence of a substrate in a carrier head
    3.
    发明授权
    Method for detecting the presence of a substrate in a carrier head 有权
    用于检测载体头中的基底的存在的方法

    公开(公告)号：US06244932B1

    公开(公告)日：2001-06-12

    申请号：US09369663

    申请日：1999-08-05

    申请人： Boris Govzman ,  Steven M. Zuniga ,  Hung Chen

    发明人： Boris Govzman ,  Steven M. Zuniga ,  Hung Chen

    IPC分类号： B24B4900

    CPC分类号： B24B37/30 ,  B24B37/0053

    摘要： A carrier head for a chemical mechanical polishing system includes a substrate sensing mechanism. The carrier head includes a base and a flexible member connected to the base to define a chamber. A lower surface of the flexible member provides a substrate receiving surface. The substrate sensing mechanism includes a sensor to measure a pressure in the chamber and generate an output signal representative thereof, and a processor configured to indicate whether the substrate is attached to the substrate receiving surface in response to the output signal.

    摘要翻译： 用于化学机械抛光系统的载体头包括基底感测机构。 承载头包括基部和连接到基部以限定室的柔性构件。 柔性构件的下表面提供衬底接收表面。 衬底检测机构包括用于测量腔室中的压力并产生代表其的输出信号的传感器，以及被配置为响应于输出信号指示衬底是否附着到衬底接收表面的处理器。

    Carrier head including a flexible membrane and a compliant backing member for a chemical mechanical polishing apparatus
    5.
    发明授权
    Carrier head including a flexible membrane and a compliant backing member for a chemical mechanical polishing apparatus 有权
    载体头包括柔性膜和用于化学机械抛光装置的柔顺背衬构件

    公开(公告)号：US06277009B1

    公开(公告)日：2001-08-21

    申请号：US09478943

    申请日：2000-01-06

    申请人： Hung Chen ,  Steven M. Zuniga

    发明人： Hung Chen ,  Steven M. Zuniga

    IPC分类号： B24B722

    CPC分类号： B24B37/30 ,  B24B37/32

    摘要： A carrier head for a chemical mechanical polishing apparatus includes a flexible membrane, the lower surface of which provides a substrate-receiving surface. The carrier head includes a compliant backing member with a plurality of cells which contact an upper surface of the flexible membrane to improve vacuum-chucking of the substrate.

    摘要翻译： 用于化学机械抛光装置的载体头包括柔性膜，其下表面提供基板接收表面。 承载头包括具有多个单元的柔性背衬构件，所述多个单元接触柔性膜的上表面以改善基板的真空吸附。

    Carrier head with a flexible membrane for a chemical mechanical polishing system
    6.
    发明授权
    Carrier head with a flexible membrane for a chemical mechanical polishing system 有权
    带有柔性膜的载体头，用于化学机械抛光系统

    公开(公告)号：US06386955B2

    公开(公告)日：2002-05-14

    申请号：US09730944

    申请日：2000-12-05

    申请人： Steven M. Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

    发明人： Steven M. Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

    IPC分类号： B24B100

    CPC分类号： B24B37/30 ,  B24B37/32

    摘要： A carrier head for a chemical mechanical polishing apparatus. The carrier head includes a housing, a base, a loading mechanism, a gimbal mechanism, and a substrate backing assembly. The substrate backing assembly includes a support structure positioned below the base, a substantially horizontal, annular flexure connecting the support structure to the base, and a flexible membrane connected to the support structure. The flexible membrane has a mounting surface for a substrate, and extends beneath the base to define a chamber.

    摘要翻译： 用于化学机械抛光装置的载体头。 承载头包括壳体，基座，装载机构，万向节机构和基底背衬组件。 衬底背衬组件包括位于底座下方的支撑结构，将支撑结构连接到基座的基本水平的环形弯曲部，以及连接到支撑结构的柔性膜。 柔性膜具有用于基底的安装表面，并且在基底之下延伸以限定腔室。

    Carrier head with a flexible membrane
    8.
    发明授权
    Carrier head with a flexible membrane 失效
    带头的柔性膜

    公开(公告)号：US07040971B2

    公开(公告)日：2006-05-09

    申请号：US10946186

    申请日：2004-09-20

    申请人： Steven M. Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

    发明人： Steven M. Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

    IPC分类号： B24B1/00

    CPC分类号： B24B37/30 ,  B24B37/32

    摘要： A carrier head for a chemical mechanical polishing apparatus is described. The carrier head has a base, a rigid body, a membrane and a pressurizing structure. The rigid body is movable relative to the base and includes a downwardly-extending projection. The membrane has a mounting surface for a substrate. The membrane extends below the base to provide a chamber between the base and the membrane. The pressurizing structure applies a downward pressure on the rigid body to cause a lower surface of the rigid body to press on an inner surface of the membrane.

    摘要翻译： 描述了用于化学机械抛光装置的载体头。 承载头具有底座，刚体，膜和加压结构。 刚体相对于基座可移动并包括向下延伸的突出部。 膜具有用于基底的安装表面。 膜延伸到底部下方以在基底和膜之间提供腔室。 加压结构向刚体施加向下的压力，以使刚体的下表面压在膜的内表面上。

    Carrier head with a flexure
    9.
    发明授权
    Carrier head with a flexure 有权
    承载头弯曲

    公开(公告)号：US06857946B2

    公开(公告)日：2005-02-22

    申请号：US10353326

    申请日：2003-01-28

    申请人： Steven M. Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

    发明人： Steven M. Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

    IPC分类号： B24B37/30 ,  B24B37/32 ,  B24B49/16 ,  H01L21/304 ,  B24B1/00

    CPC分类号： B24B37/30 ,  B24B37/32

    摘要： A carrier head for a chemical mechanical polishing apparatus. The carrier head includes a housing, a base, a loading mechanism, a gimbal mechanism, and a substrate backing assembly. The substrate backing assembly includes a support structure positioned below the base, a substantially horizontal, annular flexure connecting the support structure to the base, and a flexible membrane connected to the support structure. The flexible membrane has a mounting surface for a substrate, and extends beneath the base to define a chamber.

    摘要翻译： 用于化学机械抛光装置的载体头。 承载头包括壳体，基座，装载机构，万向节机构和基底背衬组件。 衬底背衬组件包括位于底座下方的支撑结构，将支撑结构连接到基座的基本水平的环形弯曲部，以及连接到支撑结构的柔性膜。 柔性膜具有用于基底的安装表面，并且在基底之下延伸以限定腔室。

    Carrier head with a flexible membrane for a chemical mechanical polishing system
    10.
    发明授权
    Carrier head with a flexible membrane for a chemical mechanical polishing system 失效
    带有柔性膜的载体头，用于化学机械抛光系统

    公开(公告)号：US06183354B2

    公开(公告)日：2001-02-06

    申请号：US08861260

    申请日：1997-05-21

    申请人： Steven M. Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

    发明人： Steven M. Zuniga ,  Manoocher Birang ,  Hung Chen ,  Sen-Hou Ko

    IPC分类号： B24B500

    CPC分类号： B24B37/30 ,  B24B37/32

    摘要： A carrier head for a chemical mechanical polishing apparatus. The carrier head includes a housing, a base, a loading mechanism, a gimbal mechanism, and a substrate backing assembly. The substrate backing assembly includes a support structure positioned below the base, a substantially horizontal, annular flexure connecting the support structure to the base, and a flexible membrane connected to the support structure. The flexible membrane has a mounting surface for a substrate, and extends beneath the base to define a chamber.

    摘要翻译： 用于化学机械抛光装置的载体头。 承载头包括壳体，基座，装载机构，万向节机构和基底背衬组件。 衬底背衬组件包括位于底座下方的支撑结构，将支撑结构连接到基座的基本水平的环形弯曲部，以及连接到支撑结构的柔性膜。 柔性膜具有用于基底的安装表面，并且在基底之下延伸以限定腔室。