- 专利标题: Nitride semiconductor device
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申请号: US743729申请日: 1996-11-06
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公开(公告)号: US5959307A公开(公告)日: 1999-09-28
- 发明人: Shuji Nakamura , Shinichi Nagahama , Naruhito Iwasa
- 申请人: Shuji Nakamura , Shinichi Nagahama , Naruhito Iwasa
- 申请人地址: JPX
- 专利权人: Nichia Chemical Industries Ltd.
- 当前专利权人: Nichia Chemical Industries Ltd.
- 当前专利权人地址: JPX
- 优先权: JPX7-287189 19951106; JPX7-305279 19951124; JPX7-305280 19951124; JPX7-305281 19951124; JPX7-317850 19951206; JPX7-332056 19951220; JPX8-186339 19960716; JPX8-228147 19960829
- 主分类号: H01L33/02
- IPC分类号: H01L33/02 ; H01L33/06 ; H01L33/32 ; H01S5/20 ; H01S5/343 ; H01L29/06
摘要:
A nitride semiconductor device has a nitride semiconductor layer structure. The structure includes an active layer of a quantum well structure containing an indium-containing nitride semiconductor. A first nitride semiconductor layer having a band gap energy larger than that of the active layer is provided in contact with the active layer. A second nitride semiconductor layer having a band gap energy smaller than that of the first layer is provided over the first layer. Further, a third nitride semiconductor layer having a band gap energy larger than that of the second layer is provided over the second layer.
公开/授权文献
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