发明授权
US5968346A Two stage hydroprocessing with vapor-liquid interstage contacting for
vapor heteroatom removal
有权
双级加氢处理,气 - 液间级接触气相除去杂原子
- 专利标题: Two stage hydroprocessing with vapor-liquid interstage contacting for vapor heteroatom removal
- 专利标题(中): 双级加氢处理,气 - 液间级接触气相除去杂原子
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申请号: US153921申请日: 1998-09-16
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公开(公告)号: US5968346A公开(公告)日: 1999-10-19
- 发明人: Henry Jung , Ramesh Gupta , Edward S. Ellis , William E. Lewis
- 申请人: Henry Jung , Ramesh Gupta , Edward S. Ellis , William E. Lewis
- 申请人地址: NJ Florham Park
- 专利权人: Exxon Research and Engineering Co.
- 当前专利权人: Exxon Research and Engineering Co.
- 当前专利权人地址: NJ Florham Park
- 主分类号: C10G65/02
- IPC分类号: C10G65/02 ; C10G45/02 ; C10G65/04 ; C10G65/10 ; C10G65/12 ; C10G70/06
摘要:
A hydroprocessing process includes two hydroprocessing reaction stages, both of which produce a liquid and a vapor effluent, and a liquid-vapor contacting stage. The first stage vapor effluent contains impurities, such as heteroatom compounds, which are removed from the vapor by contact with processed liquid effluent derived from one or both reaction stages and, optionally, also liquid recovered from processed vapor. The first and contact stage liquid effluents are passed into the second stage to finish the hydoprocessing. The contact and second stage vapor effluents are cooled to recover additional hydroprocessed product liquid.
公开/授权文献
- US5162233A Method of detecting and analyzing impurities 公开/授权日:1992-11-10
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