- 专利标题: Image-wise exposure apparatus, mirror array device, and liquid crystal panel
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申请号: US807401申请日: 1997-02-27
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公开(公告)号: US5990921A公开(公告)日: 1999-11-23
- 发明人: Hiroshi Sunagawa
- 申请人: Hiroshi Sunagawa
- 申请人地址: JPX Kanagawa-ken
- 专利权人: Fuji Photo Film Co., LTD
- 当前专利权人: Fuji Photo Film Co., LTD
- 当前专利权人地址: JPX Kanagawa-ken
- 优先权: JPX8-039489 19960227; JPX8-136767 19960530
- 主分类号: B41J2/465
- IPC分类号: B41J2/465 ; G02B26/08 ; G02F1/13 ; G02F1/1335 ; G03B27/32 ; G01D15/14
摘要:
An image-wise exposure apparatus includes a mirror array device comprising a plurality of small mirrors which are two-dimensionally arrayed in two directions normal to each other and a drive mechanism for changing the orientations of the respective small mirrors independently from each other so that light impinging upon each of the small mirrors is reflected selectively in one of a first direction in which the reflected light impinges upon the photosensitive material and a second direction in which the reflected light does not impinge upon the photosensitive material. A control circuit controls the drive mechanism according to an image signal. In the image-wise exposure apparatus, picture element shifting is carried out. There is provided an antireflective mask which limits the effective aperture of each small mirror to a continuous region not longer than 1.5 a/m as measured in a direction in which the picture element shifting operation is carried out, wherein a represents the mirror pitches in the direction of the picture element shifting and m represents the times by which the number of exposure dots are multiplied by the picture element shifting in the direction.
公开/授权文献
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