发明授权
- 专利标题： Surface pattern unevenness detecting method and apparatus
- 专利标题（中）： 表面图案不均匀检测方法及装置
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申请号： US116111申请日： 1998-07-15
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公开(公告)号： US5991038A公开(公告)日： 1999-11-23
- 发明人: Shigeru Yamamoto
- 申请人： Shigeru Yamamoto
- 申请人地址： JPX Tokyo
- 专利权人： ODP Co., Ltd.
- 当前专利权人： ODP Co., Ltd.
- 当前专利权人地址： JPX Tokyo
- 主分类号： G01B11/30
- IPC分类号： G01B11/30 ; G01M11/00 ; G02F1/13 ; G02F1/136 ; G02F1/1368
摘要：
The present invention provides an apparatus and associated method of detecting pattern unevenness in the surface of an object. The apparatus includes a light source for irradiating surfaces of an object and a line sensor camera for detecting unevenness in the surfaces. The method comprises the steps of irradiating a light onto a surface having a pattern formed on the surface thereof, and observing the scattered light from the pattern edge portions, thereby inspecting pattern unevenness by way of the line sensor camera.
公开/授权文献
- US5521839A Deep level transient spectroscopy (DLTS) system and method 公开/授权日：1996-05-28
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