发明授权
US6060711A Charged-particle optical systems and pattern transfer apparatus
comprising same
失效
带电粒子的光学系统和包括它的图案转印装置
- 专利标题: Charged-particle optical systems and pattern transfer apparatus comprising same
- 专利标题(中): 带电粒子的光学系统和包括它的图案转印装置
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申请号: US014004申请日: 1998-01-27
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公开(公告)号: US6060711A公开(公告)日: 2000-05-09
- 发明人: Hiroyasu Shimizu
- 申请人: Hiroyasu Shimizu
- 申请人地址: JPX Tokyo
- 专利权人: Nikon Corporation
- 当前专利权人: Nikon Corporation
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX9-012615 19970127; JPX9-174399 19970630
- 主分类号: H01J37/147
- IPC分类号: H01J37/147 ; H01J37/153 ; H01J37/317 ; H01J37/14
摘要:
Charged-particle beam pattern transfer apparatus and charged-particle beam optical systems are disclosed. A representative charged-particle beam pattern transfer apparatus comprises a projection lens that images patterns from a mask onto a substrate. To reduce off-axis image aberrations, especially anisotropic coma and astigmatism, deflectors are provided that produce a magnetic field such that the effective optical axis of the lenses is along a straight line that is tilted with respect to the mask and the substrate. Focus correctors are provided that produce a magnetic field that corrects image focus. Mathematical descriptions of these magnetic fields are disclosed. With such magnetic fields, the charged-particle beam that irradiates a central region of a subfield on the mask propagates along a straight-line axis through the projection lens, reducing deflection aberration and improving image quality.
公开/授权文献
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