发明授权
- 专利标题: Photolithographic apparatus
- 专利标题(中): 光刻设备
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申请号: US833873申请日: 1997-04-10
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公开(公告)号: US6067146A公开(公告)日: 2000-05-23
- 发明人: Johannes C. H. Mulkens , Marinus A. Van Den Brink , Johannes C. M. Jasper
- 申请人: Johannes C. H. Mulkens , Marinus A. Van Den Brink , Johannes C. M. Jasper
- 申请人地址: NLX Eindhoven
- 专利权人: ASM Lithography B.V.
- 当前专利权人: ASM Lithography B.V.
- 当前专利权人地址: NLX Eindhoven
- 优先权: EPX96200936 19960410
- 主分类号: H01L21/027
- IPC分类号: H01L21/027 ; G03F7/20 ; G03B27/72 ; G03B27/42
摘要:
Photolithographic apparatus (1) including an illumination unit (3). The illumination unit (3) comprises, in this order, a radiation source unit (11), a first optical system (5) and an optical waveguide (17). The apparatus (1) further includes a second optical system (7) and a mask table (9). The apparatus (1) is adapted in such a way that both the stepper mode and the scanner mode are selectable modi, and comprises means by which the illumination unit (11), when being operative, has a slit-shaped static illumination field with a width s which is variable between s.sub.min and s.sub.max while substantially maintaining energy within the static illumination field.
公开/授权文献
- US4675259A Electrical energy package and method of assembly 公开/授权日:1987-06-23