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22 条记录 (耗时 0.026 秒)

    Method of detecting aberrations of an optical imaging system
    1.
    发明申请
    Method of detecting aberrations of an optical imaging system 失效
    检测光学成像系统的像差的方法

    公开(公告)号：US20010053489A1

    公开(公告)日：2001-12-20

    申请号：US09878981

    申请日：2001-06-12

    申请人： PHILIPS CORPORATION and ASM LITHOGRAPHY B.V.

    发明人： Peter Dirksen ,  Casparus A.H. Juffermans

    IPC分类号： G03C005/00 ,  G03B027/00 ,  G06K009/00

    CPC分类号： G03F7/706 ,  G03F7/70241 ,  G03F7/70358 ,  Y10S430/143

    摘要： Aberrations of an imaging system (PL) can be detected in an accurate and reliable way by imaging, by means of the imaging system, a circular phase structure (22) on a photoresist (PR), developing the resist and scanning it with a scanning detection device (SEM) which is coupled to an image processor (IP). The circular phase structure is imaged in a ring structure (25) and each type of aberration, like coma, astigmatism, three-point aberration, etc. causes a specific change in the shape of the inner contour (CI) and the outer contour (CE) of the ring and/or a change in the distance between these contours, so that the aberrations can be detected independently of each other. Each type of aberration is represented by a specific Fourier harmonic (Znull), which is composed of Zernike coefficients (Znull), each representing a specific lower or higher order sub-aberration. The new method enables to determine these sub-aberrations The new method may be used for measuring a projection system for a lithographic projection apparatus.

    摘要翻译： 可以通过成像系统在光致抗蚀剂（PR）上成像圆形相结构（22），以准确和可靠的方式检测成像系统（PL）的像差，显影抗蚀剂并用扫描扫描 检测装置（SEM），其耦合到图像处理器（IP）。 圆形相结构以环形结构（25）成像，并且每种类型的像差（如昏迷，散光，三点像差等）导致内部轮廓（CI）和外部轮廓（CI）的形状的特定变化 CE）和/或这些轮廓之间的距离的变化，使得能够彼此独立地检测像差。 每种类型的像差由特定的傅立叶谐波（Z-）表示，其由Zernike系数（Z-）组成，每个代表特定的较低或更高阶的子像差。 新方法可以确定这些子像差新方法可用于测量光刻投影设备的投影系统。

    Pneumatic support device with a controlled gas supply, and lithographic device provided with such a support device
    6.
    发明授权
    Pneumatic support device with a controlled gas supply, and lithographic device provided with such a support device 失效
    具有受控气体供应的气动支撑装置以及设置有这种支撑装置的光刻装置

    公开(公告)号：US6144442A

    公开(公告)日：2000-11-07

    申请号：US90034

    申请日：1998-06-10

    申请人： Jacob J. 'T Mannetje ,  Frank Auer

    发明人： Jacob J. 'T Mannetje ,  Frank Auer

    IPC分类号： F16F15/023 ,  F16F15/027 ,  G03F7/20 ,  H01L21/027 ,  G03B27/60 ,  G03B27/42

    CPC分类号： F16C32/06 ,  F16F15/0232 ,  F16F15/0275 ,  G03F7/70691 ,  G03F7/70833

    摘要： Support device (53) provided with a first part (69) and a second part (71) which is supported relative to the first part by means of a gas spring (73) having a pressure chamber (75). A gas supply (117), which compensates for gas leakage from the pressure chamber (75) during operation, is connected to an intermediate space (119) which is in communication with the pressure chamber (75) via a pneumatic restriction (121). The gas pressure present in the intermediate space (119) is held as constant as possible during operation by means of a control loop (123), to prevent transmission of pressure fluctuations which are present in the gas supply (117) to the pressure chamber (75) as much as possible. Such pressure fluctuations are undesirable in the pressure chamber because they cause mechanical vibrations in the second part of the support device and the device to be supported. The support device is used in a lithographic device for the support of a frame (39) with respect to a base (37), the frame (39) supporting a focusing unit (5).

    摘要翻译： 支撑装置（53）具有第一部分（69）和第二部分（71），第二部分（71）通过具有压力室（75）的气体弹簧（73）相对于第一部分被支撑。 在操作期间补偿来自压力室（75）的气体泄漏的气体供给（117）通过气动限制（121）连接到与压力室（75）连通的中间空间（119）。 存在于中间空间119中的气体压力在操作期间通过控制回路123保持为恒定，以防止气体供应（117）中存在于压力室（117）中的压力波动 75）。 这种压力波动在压力室中是不期望的，因为它们在支撑装置的第二部分和被支撑的装置中引起机械振动。 支撑装置用于光刻设备中，用于相对于基座（37）支撑框架（39），框架（39）支撑聚焦单元（5）。

    Photolithographic apparatus
    7.
    发明授权
    Photolithographic apparatus 失效
    光刻设备

    公开(公告)号：US6067146A

    公开(公告)日：2000-05-23

    申请号：US833873

    申请日：1997-04-10

    申请人： Johannes C. H. Mulkens ,  Marinus A. Van Den Brink ,  Johannes C. M. Jasper

    发明人： Johannes C. H. Mulkens ,  Marinus A. Van Den Brink ,  Johannes C. M. Jasper

    IPC分类号： H01L21/027 ,  G03F7/20 ,  G03B27/72 ,  G03B27/42

    CPC分类号： G03F7/70058 ,  G03F7/70358 ,  G03F7/70425

    摘要： Photolithographic apparatus (1) including an illumination unit (3). The illumination unit (3) comprises, in this order, a radiation source unit (11), a first optical system (5) and an optical waveguide (17). The apparatus (1) further includes a second optical system (7) and a mask table (9). The apparatus (1) is adapted in such a way that both the stepper mode and the scanner mode are selectable modi, and comprises means by which the illumination unit (11), when being operative, has a slit-shaped static illumination field with a width s which is variable between s.sub.min and s.sub.max while substantially maintaining energy within the static illumination field.

    摘要翻译： 包括照明单元（3）的光刻设备（1）。 照明单元（3）依次包括辐射源单元（11），第一光学系统（5）和光波导（17）。 装置（1）还包括第二光学系统（7）和掩模台（9）。 该装置（1）适于使步进模式和扫描器模式都可选择，并且包括这样的装置，照明单元（11）在操作时具有狭缝状的静态照明场，其中具有 宽度s在smin和smax之间是可变的，同时在静态照明领域内基本上保持能量。

    Interferometer system and lithograph apparatus including an interferometer system
    8.
    发明授权
    Interferometer system and lithograph apparatus including an interferometer system 失效
    干涉仪系统和包括干涉仪系统的光刻设备

    公开(公告)号：US06020964A

    公开(公告)日：2000-02-01

    申请号：US114747

    申请日：1998-07-13

    申请人： Erik R. Loopstra ,  Alexander Straaijer

    发明人： Erik R. Loopstra ,  Alexander Straaijer

    IPC分类号： G01B9/02 ,  G03F7/20 ,  H01L21/027

    CPC分类号： G03F7/70716 ,  G03F7/70775

    摘要： A composite interferometer system has a plurality of X and/or Y measuring axes which co-operate with an X and/or Y measuring mirror arranged on an object. The interferometer system also has at least one Z measuring axis, which extends partly in an XY plane and co-operates with Z measuring mirrors arranged on the object and Z reflectors. Thus, a larger number of more accurate and reliable measurements can be performed with the interferometer system.

    摘要翻译： 复合干涉仪系统具有与安置在物体上的X和/或Y测量镜配合的多个X和/或Y测量轴。 干涉仪系统还具有至少一个Z测量轴，其部分地在XY平面中延伸并且与布置在物体上的Z测量镜和Z反射器配合。 因此，可以用干涉仪系统进行更多的更准确和可靠的测量。

    Multilayer extreme ultraviolet mirrors with enhanced reflectivity
    10.
    发明申请
    Multilayer extreme ultraviolet mirrors with enhanced reflectivity 有权
    具有增强反射率的多层极紫外镜

    公开(公告)号：US20030043456A1

    公开(公告)日：2003-03-06

    申请号：US10205206

    申请日：2002-07-26

    申请人： ASM LITHOGRAPHY B.V.

    发明人： Mandeep Singh

    IPC分类号： G02B001/00 ,  G02B005/08 ,  G02B005/20 ,  F21V009/04 ,  F21V009/06 ,  G02B007/182

    CPC分类号： B82Y10/00 ,  G02B5/0891 ,  G03F1/24 ,  G03F7/70058 ,  G03F7/70233 ,  G03F7/70958 ,  G03F7/70983 ,  G21K1/06 ,  G21K1/062 ,  G21K2201/061 ,  Y10S359/90 ,  Y10T428/24355

    摘要： The reflectivity of multilayered EUV mirrors tuned for 11-16 nm, for which the two-component Mo/Be and Mo/Si multilayered systems are commonly used, is enhanced by incorporating additional elements and their compounds mainly from period 5 of the periodic table. In addition, the reflectivity performance of the multilayer stacks is further enhanced by a numerical global optimization procedure by which the layer thicknesses are varied for optimum performance in, contradistinction to the constant layer thicknessnulli.e. constant partition rationullmultilayer stacks commonly designed and, fabricated hitherto. By incorporating additional materials with differing complex refractive indices in various regions of the stack, or by wholly replacing one of the components (typically Mo), we have observed peak reflectivity enhancements of up to 5% for a single reflector compared to a standard unoptimized stack. The additional materials used are: Rb, RbCl, Sr, Y, Zr, Ru, Rh, Tc, Pd, Nb and Be. Protective capping layers of B, Ru, Rh, C, Si3N4, SiC, in addition to protecting the mirrors from environmental attack, may serve to improve the reflectivity characteristics.

    摘要翻译： 通常使用双组分Mo / Be和Mo / Si多层体系的11-16nm的多层EUV反射镜的反射率通过主要从周期表的第5周引入附加元素及其化合物来增强。 此外，通过数值全局优化程序进一步增强了多层堆叠的反射性能，通过该数值全局优化程序，层厚度随着恒定层厚度的变化而达到最佳性能。 常规分配比 - 通常设计和制造的多层堆叠。 通过在堆叠的各个区域中引入具有不同复合折射率的附加材料，或通过完全替代其中一个部件（通常为Mo）），与标准非优化堆叠相比，我们观察到单个反射器的峰值反射率增强高达5％ 。 使用的附加材料有：Rb，RbCl，Sr，Y，Zr，Ru，Rh，Tc，Pd，Nb和Be。 B，Ru，Rh，C，Si3N4，SiC的保护性覆盖层除了保护镜子免受环境攻击之外，还可用于提高反射率特性。