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公开(公告)号:US06239862B1
公开(公告)日:2001-05-29
申请号:US09506343
申请日:2000-02-18
IPC分类号: G03B2742
CPC分类号: G03F7/70058 , G03F7/70358 , G03F7/70425
摘要: Photolithographic apparatus (1) including an illumination unit (3). The illumination unit (3) comprises, in this order, a radiation source unit (11), a first optical system (5) and an optical waveguide (17). The apparatus (1) further includes a second optical system (7) and a mask table (9). The apparatus (1) is adapted in such a way that both the stepper mode and the scanner mode are selectable modi, and comprises means by which the illumination unit (11), when being operative, has a slit-shaped static illumination field with a width s which is variable between smin and smax while substantially maintaining energy within the static illumination field.
摘要翻译: 包括照明单元(3)的光刻设备(1)。 照明单元(3)依次包括辐射源单元(11),第一光学系统(5)和光波导(17)。 装置(1)还包括第二光学系统(7)和掩模台(9)。 该装置(1)适于使步进模式和扫描器模式都可选择,并且包括这样的装置,照明单元(11)在操作时具有狭缝状的静态照明场,其中具有 宽度s在smin和smax之间是可变的,同时在静态照明领域内基本上保持能量。
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公开(公告)号:US07019815B2
公开(公告)日:2006-03-28
申请号:US10975429
申请日:2004-10-29
申请人: Johannes C. M. Jasper , Erik R. Loopstra , Theodorus M. Modderman , Gerrit J. Nijmeijer , Nicolaas A. A. J. van Asten , Frederik T. E. Heuts , Jacobus Gemen , Richard J. H. Du Croo de Jongh , Marcus E. J. Boonman , Jacob F. F. Klinkhamer , Thomas J. M. Castenmiller
发明人: Johannes C. M. Jasper , Erik R. Loopstra , Theodorus M. Modderman , Gerrit J. Nijmeijer , Nicolaas A. A. J. van Asten , Frederik T. E. Heuts , Jacobus Gemen , Richard J. H. Du Croo de Jongh , Marcus E. J. Boonman , Jacob F. F. Klinkhamer , Thomas J. M. Castenmiller
CPC分类号: G03F9/7026 , G03F9/70 , G03F9/7034 , G03F9/7049 , G03F9/7096
摘要: In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.
摘要翻译: 在离轴调平程序中,在测量站产生衬底的高度图。 高度图参考衬底台的物理参考表面。 物理参考表面可以是其中插入透射图像传感器的表面。 在曝光站,测量物理基准表面的高度并与投影透镜的焦平面相关。 然后可以使用高度图来确定衬底台的最佳高度和/或倾斜,以在曝光期间以最佳聚焦将曝光区域定位在衬底上。 相同的原理可以应用于(反射)掩模。
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公开(公告)号:US06674510B1
公开(公告)日:2004-01-06
申请号:US09519875
申请日:2000-03-06
申请人: Johannes C. M. Jasper , Erik R. Loopstra , Theodorus M. Modderman , Gerrit J. Nijmeijer , Nicolaas A. A. J. van Asten , Frederik T. E. Heuts , Jacobus Gemen , Richard J. H. Du Croo de Jongh , Marcus E. J. Boonman , Jacob F. F. Klinkhamer , Thomas J. M. Castenmiller
发明人: Johannes C. M. Jasper , Erik R. Loopstra , Theodorus M. Modderman , Gerrit J. Nijmeijer , Nicolaas A. A. J. van Asten , Frederik T. E. Heuts , Jacobus Gemen , Richard J. H. Du Croo de Jongh , Marcus E. J. Boonman , Jacob F. F. Klinkhamer , Thomas J. M. Castenmiller
IPC分类号: G03B2752
CPC分类号: G03F9/7026 , G03F9/70 , G03F9/7034 , G03F9/7049 , G03F9/7096
摘要: In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.
摘要翻译: 在离轴调平程序中,在测量站产生衬底的高度图。 高度图参考衬底台的物理参考表面。 物理参考表面可以是其中插入透射图像传感器的表面。 在曝光站,测量物理基准表面的高度并与投影透镜的焦平面相关。 然后可以使用高度图来确定衬底台的最佳高度和/或倾斜,以在曝光期间以最佳聚焦将曝光区域定位在衬底上。 相同的原理可以应用于(反射)掩模。
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公开(公告)号:US6067146A
公开(公告)日:2000-05-23
申请号:US833873
申请日:1997-04-10
IPC分类号: H01L21/027 , G03F7/20 , G03B27/72 , G03B27/42
CPC分类号: G03F7/70058 , G03F7/70358 , G03F7/70425
摘要: Photolithographic apparatus (1) including an illumination unit (3). The illumination unit (3) comprises, in this order, a radiation source unit (11), a first optical system (5) and an optical waveguide (17). The apparatus (1) further includes a second optical system (7) and a mask table (9). The apparatus (1) is adapted in such a way that both the stepper mode and the scanner mode are selectable modi, and comprises means by which the illumination unit (11), when being operative, has a slit-shaped static illumination field with a width s which is variable between s.sub.min and s.sub.max while substantially maintaining energy within the static illumination field.
摘要翻译: 包括照明单元(3)的光刻设备(1)。 照明单元(3)依次包括辐射源单元(11),第一光学系统(5)和光波导(17)。 装置(1)还包括第二光学系统(7)和掩模台(9)。 该装置(1)适于使步进模式和扫描器模式都可选择,并且包括这样的装置,照明单元(11)在操作时具有狭缝状的静态照明场,其中具有 宽度s在smin和smax之间是可变的,同时在静态照明领域内基本上保持能量。
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