发明授权
US6075607A Method for estimating durability of optical member against excimer laser
irradiation and method for selecting silica glass optical member
有权
用于估计光学构件对准分子激光照射的耐久性的方法和选择石英玻璃光学构件的方法
- 专利标题: Method for estimating durability of optical member against excimer laser irradiation and method for selecting silica glass optical member
- 专利标题(中): 用于估计光学构件对准分子激光照射的耐久性的方法和选择石英玻璃光学构件的方法
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申请号: US166528申请日: 1998-10-06
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公开(公告)号: US6075607A公开(公告)日: 2000-06-13
- 发明人: Hiroki Jinbo , Norio Komine , Seishi Fujiwara
- 申请人: Hiroki Jinbo , Norio Komine , Seishi Fujiwara
- 申请人地址: JPX Tokyo
- 专利权人: Nikon Corporation
- 当前专利权人: Nikon Corporation
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX9-274200 19971007
- 主分类号: G01N21/88
- IPC分类号: G01N21/88 ; G01N17/00 ; G01N21/59 ; G01N21/958 ; G01B11/00
摘要:
A method is provided for estimating durability of an optical member against pulsed excimer laser beam irradiation. The method includes the steps of (a) irradiating a test sample for the optical member with a pulsed excimer laser beam to induce changes in transparency of the test sample with respect to the pulsed excimer laser beam, the irradiation being performed for such a time period as to cover not only a linear region and a saturation region and (b) measuring changes in the transparency of the test sample with respect to the pulsed excimer laser beam as a function of the cumulative number of the excimer laser pulses that have irradiated the test sample in step (a). The method further includes the step of (c) repeating steps (a) and (b) with a plurality of different first predetermined energy densities of the pulsed excimer laser beam to derive a correlation equation representing the changes in the transparency of the test sample in the linear region and the saturated region in terms of the energy density of the pulsed excimer laser beam and the cumulative number of the excimer laser pulses and (d) estimating the durability of the optical member under actual usage conditions using the derived correlation equation.
公开/授权文献
- US5544193A Vertical cavity laser of low resistivity 公开/授权日:1996-08-06
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