发明授权
- 专利标题: Diamond films and methods for manufacturing diamond films
- 专利标题(中): 金刚石薄膜和制造金刚石薄膜的方法
-
申请号: US924701申请日: 1997-09-05
-
公开(公告)号: US6080378A公开(公告)日: 2000-06-27
- 发明人: Yoshihiro Yokota , Takeshi Tachibana , Koichi Miyata , Koji Kobashi
- 申请人: Yoshihiro Yokota , Takeshi Tachibana , Koichi Miyata , Koji Kobashi
- 申请人地址: JPX Kobe
- 专利权人: Kabushiki Kaisha Kobe Seiko Sho
- 当前专利权人: Kabushiki Kaisha Kobe Seiko Sho
- 当前专利权人地址: JPX Kobe
- 优先权: JPX8-257590 19960905
- 主分类号: C30B29/04
- IPC分类号: C30B29/04 ; C23C16/27 ; C30B25/10
摘要:
Diamond films and novel method to grow the diamond films can improve the performance of products utilizing diamond films. In the cathodoluminescence taken at room temperature, the integrated intensity ratio of the diamond films, CL.sub.1 /CL.sub.2, is equal or greater than 1/20, where CL.sub.1 is the integrated intensity of the emission band in the wavelength region shorter than 300 nm while CL.sub.2 is the integrated intensity of the emission band in the wavelength region from 300 nm to 800 nm. Such high quality diamond films with intensive coalescence on the surface can be obtained by deposition on the substrates or films, made of at least one member selected from the group consisting of platinum, platinum alloys, iridium, iridium alloys, nickel, nickel alloys, silicon, and metal silicides.
公开/授权文献
信息查询
IPC分类: