发明授权
- 专利标题: Method and apparatus for direct probe sensing
- 专利标题(中): 用于直接探针感测的方法和装置
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申请号: US980595申请日: 1997-12-01
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公开(公告)号: US6096567A公开(公告)日: 2000-08-01
- 发明人: Russell Kaplan , Ralph Scherp
- 申请人: Russell Kaplan , Ralph Scherp
- 申请人地址: CA Santa Clara
- 专利权人: Electroglas, Inc.
- 当前专利权人: Electroglas, Inc.
- 当前专利权人地址: CA Santa Clara
- 主分类号: G01R1/06
- IPC分类号: G01R1/06 ; G01R31/28 ; H01L21/66
摘要:
An improved method and apparatus for automatically aligning a wafer prober to the bonding pads of a semiconductor device are provided. In one embodiment of one aspect of the invention, a pattern of contact electrodes is located using a low magnification image of a number of contact electrodes. A shape representative of a contact electrode point is then fitted to each of the number of contact electrodes using a high magnification image of the contact electrodes and a centroid of that fitted shape is determined. The position of the centroid is compared to the position of each of the number of pads, and the pads and contact electrodes are moved relative to each other to a position for contact between the pads and contact electrodes. Other aspects and other embodiments are also described.
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