发明授权
- 专利标题: Polishing method for semiconductors and apparatus therefor
- 专利标题(中): 半导体抛光方法及其设备
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申请号: US80728申请日: 1998-05-21
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公开(公告)号: US6099393A公开(公告)日: 2000-08-08
- 发明人: Soichi Katagiri , Shigeo Moriyama , Kan Yasui , Katsuhiko Yamaguchi
- 申请人: Soichi Katagiri , Shigeo Moriyama , Kan Yasui , Katsuhiko Yamaguchi
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX9-156135 19970530
- 主分类号: B24B37/00
- IPC分类号: B24B37/00 ; B24B53/007 ; B24B53/013 ; H01L21/304 ; B24B1/00
摘要:
In the polishing machine 10 for pressing the polished surface 7 of the workpiece 1 against the face where there are abrasives 15 of the rotating polishing tool 11 and executing chemical mechanical polishing, the brushing device 30, the cleaner 40, the abrasive supplier 52, and the pure water supplier 60 are sequentially arranged behind the location of the head 20 for pressing the workpiece 1 against the polishing tool 11 in the rotational direction. The cleaner 40 sprays the cleaning water 47 to the face where there are abrasives 15 of the rotating polishing tool 11 and sucks and collects it by the vacuum hole 45. Fresh slurry 62 is always supplied by the slurry supplier 63 comprising the abrasive supplier 52 and the pure water supplier 60.
公开/授权文献
- USD409371S Sports container carrier 公开/授权日:1999-05-11
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