发明授权
- 专利标题： Apparatus for processing a substrate providing an efficient arrangement and atmospheric isolation of chemical treatment section
- 专利标题（中）： 用于处理衬底的装置，其提供化学处理部分的有效布置和大气隔离
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申请号： US993284申请日： 1997-12-18
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公开(公告)号： US6099643A公开(公告)日： 2000-08-08
- 发明人: Masami Ohtani , Minobu Matsunaga , Tutomu Ueyama , Ryuji Kitakado , Kaoru Aoki
- 申请人： Masami Ohtani , Minobu Matsunaga , Tutomu Ueyama , Ryuji Kitakado , Kaoru Aoki
- 申请人地址： JPX
- 专利权人： Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人： Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人地址： JPX
- 优先权： JPX8-348773 19961226; JPX9-013926 19970128
- 主分类号： H01L21/00
- IPC分类号： H01L21/00 ; B05C13/00
摘要：
An atmospheric conditioning unit for supplying temperature- and humidity-controlled air to a chemical processing part (spin coater) is arranged immediately above a chemical processing part, between this chemical processing part and a heat treatment part (including a hot plate and a cool plate). Namely, the chemical processing part, the atmospheric conditioning unit and the heat treatment part are vertically arranged in a stacked manner. The atmospheric conditioning unit receives external air from an opening. A closed partition is provided to block air flow between the atmospheric conditioning unit and a transport area. The temperature- and humidity-controlled air supplied from the atmospheric conditioning unit to the spin coater forms a downflow in the spin coater, and thereafter rises through an opening and joins with the air flowing from the opening, to be introduced into the atmospheric conditioning unit again and reused.
公开/授权文献
- US5712902A Telecommunications answering feature method and apparatus 公开/授权日：1998-01-27